SCHEMBL217832

SCHEMBL217832

Nc1nnn[nH]1.[KH]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL218335 1.00
Bromide SCHEMBL8417552 0.94
SCHEMBL1596634 0.94
Ammonia Solution, Strong SCHEMBL8743497 0.94
SCHEMBL6034546 0.94
SCHEMBL6645096 0.94
SCHEMBL829608 0.94
SCHEMBL6655002 0.94
SCHEMBL3779811 0.94
SCHEMBL7543910 0.94

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 231 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025006842-A2 AUTO-IGNITING BOOSTER GAS GENERANT COMPOSITION JOYSON SAFETY SYSTEMS ACQUISITION LLC (US) 2025-01-02 WO claimed
CN-111270236-B Etchant composition and method of manufacturing metal pattern and array substrate using the same 三星显示有限公司 2023-09-22 CN claimed
CN-115613032-A Etching solution 苏州华星光电技术有限公司 2023-01-17 CN claimed
CN-108456885-B Etching solution composition and method for forming metal wiring using the same 东进世美肯株式会社 2022-08-23 CN claimed
CN-113061891-A Metal wiring etching solution composition and metal wiring forming method using same 东进世美肯株式会社 2021-07-02 CN claimed
CN-111270236-A Etchant composition and method of manufacturing metal pattern and array substrate using the same 三星显示有限公司 2020-06-12 CN claimed
US-9136137-B2 Etchant composition and methods of fabricating metal wiring and thin film transistor substrate using the same SAMSUNG DISPLAY CO., LTD. (KR) 2015-09-15 US claimed
US-9133550-B2 Etching composition, method of forming a metal pattern using the etching composition, and method of manufacturing a display substrate SAMSUNG DISPLAY CO., LTD. (KR) 2015-09-15 US claimed
US-20150087148-A1 ETCHANT COMPOSITION AND METHODS OF FABRICATING METAL WIRING AND THIN FILM TRANSISTOR SUBSTRATE USING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2015-03-26 US claimed
US-8728259-B1 Gas generator TK HOLDINGS INC. (US) 2014-05-20 US claimed
US-6835298-B2 Electrochemical transducers in fluid dispenser A.T.S. ELECTRO-LUBE HOLDINGS, LTD. (CA) 2004-12-28 US claimed
US-20040232003-A1 Electrolytic generation of nitrogen using azole derivatives A.T.S ELECTROLUBE HOLDINGS, LTD. 2004-11-25 US claimed
EP-1472389-A2 ELECTROLYTIC GENERATION OF NITROGEN USING AZOLE DERIVATIVES A.T.S. Electro-Lube Holdings Ltd. (CA) 2004-11-03 EP claimed
US-20030146104-A1 Electrolytic generation of nitrogen using azole derivatives STEPHANIA HOLDINGS INC. (CA) 2003-08-07 US claimed
WO-2003064726-A2 ELECTROLYTIC GENERATION OF NITROGEN USING AZOLE DERIVATIVES A.T.S. ELECTRO-LUBE HOLDINGS LTD. (CA) 2003-08-07 WO claimed
US-20020137875-A1 Fire suppressing gas generator composition NAVY, UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF, THE 2002-09-26 US claimed
EP-0705120-B1 APPARATUS AND METHOD FOR SUPPRESSING A FIRE OLIN CORP (US) 2002-04-17 EP claimed
EP-0705120-A1 APPARATUS AND METHOD FOR SUPPRESSING A FIRE OLIN CORPORATION (US) 1996-04-10 EP claimed
US-5449041-A 5-aminotetrazole fuel and oxidizer as solid propellant to generate high temperature nitrogen, carbon dioxide and water vapor, magnesium carbonate cooling agent OLIN CORPORATION (US) 1995-09-12 US claimed
WO-1995000205-A1 APPARATUS AND METHOD FOR SUPPRESSING A FIRE OLIN CORPORATION (US) 1995-01-05 WO claimed