SCHEMBL217832

SCHEMBL217832

Nc1nnn[nH]1.[KH]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL218335 1.00 — —
SCHEMBL1596634 0.94 — —
SCHEMBL6034546 0.94 — —
SCHEMBL3779811 0.94 — —
SCHEMBL7543910 0.94 — —
SCHEMBL6655002 0.94 — —
Ammonia Solution, Strong SCHEMBL8743497 0.94 — —
Bromide SCHEMBL8417552 0.94 — —
SCHEMBL9026076 0.94 — —
SCHEMBL829608 0.94 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 231 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025006842-A2 AUTO-IGNITING BOOSTER GAS GENERANT COMPOSITION JOYSON SAFETY SYSTEMS ACQUISITION LLC (US) 2025-01-02 — — WO claimed
CN-111270236-B Etchant composition and method of manufacturing metal pattern and array substrate using the same 三星显示有限公司 2023-09-22 — — CN claimed
CN-115613032-A Etching solution 苏州华星光电技术有限公司 2023-01-17 — — CN claimed
CN-108456885-B Etching solution composition and method for forming metal wiring using the same 东进世美肯株式会社 2022-08-23 — — CN claimed
CN-113061891-A Metal wiring etching solution composition and metal wiring forming method using same 东进世美肯株式会社 2021-07-02 — — CN claimed
CN-111270236-A Etchant composition and method of manufacturing metal pattern and array substrate using the same 三星显示有限公司 2020-06-12 — — CN claimed
US-9136137-B2 Etchant composition and methods of fabricating metal wiring and thin film transistor substrate using the same SAMSUNG DISPLAY CO., LTD. (KR) 2015-09-15 — — US claimed
US-9133550-B2 Etching composition, method of forming a metal pattern using the etching composition, and method of manufacturing a display substrate SAMSUNG DISPLAY CO., LTD. (KR) 2015-09-15 — — US claimed
US-20150087148-A1 ETCHANT COMPOSITION AND METHODS OF FABRICATING METAL WIRING AND THIN FILM TRANSISTOR SUBSTRATE USING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2015-03-26 — — US claimed
US-8728259-B1 Gas generator TK HOLDINGS INC. (US) 2014-05-20 — — US claimed
US-6835298-B2 Electrochemical transducers in fluid dispenser A.T.S. ELECTRO-LUBE HOLDINGS, LTD. (CA) 2004-12-28 — — US claimed
US-20040232003-A1 Electrolytic generation of nitrogen using azole derivatives A.T.S ELECTROLUBE HOLDINGS, LTD. 2004-11-25 — — US claimed
EP-1472389-A2 ELECTROLYTIC GENERATION OF NITROGEN USING AZOLE DERIVATIVES A.T.S. Electro-Lube Holdings Ltd. (CA) 2004-11-03 — — EP claimed
US-20030146104-A1 Electrolytic generation of nitrogen using azole derivatives STEPHANIA HOLDINGS INC. (CA) 2003-08-07 — — US claimed
WO-2003064726-A2 ELECTROLYTIC GENERATION OF NITROGEN USING AZOLE DERIVATIVES A.T.S. ELECTRO-LUBE HOLDINGS LTD. (CA) 2003-08-07 — — WO claimed
US-20020137875-A1 Fire suppressing gas generator composition NAVY, UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF, THE 2002-09-26 — — US claimed
EP-0705120-B1 APPARATUS AND METHOD FOR SUPPRESSING A FIRE OLIN CORP (US) 2002-04-17 — — EP claimed
EP-0705120-A1 APPARATUS AND METHOD FOR SUPPRESSING A FIRE OLIN CORPORATION (US) 1996-04-10 — — EP claimed
US-5449041-A 5-aminotetrazole fuel and oxidizer as solid propellant to generate high temperature nitrogen, carbon dioxide and water vapor, magnesium carbonate cooling agent OLIN CORPORATION (US) 1995-09-12 — — US claimed
WO-1995000205-A1 APPARATUS AND METHOD FOR SUPPRESSING A FIRE OLIN CORPORATION (US) 1995-01-05 — — WO claimed
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