SCHEMBL21869847

SCHEMBL21869847

C=C/C=C\C(O)=C/CC1C(C)C(C)C(C)C1CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27984622 0.73
SCHEMBL14616129 0.73
SCHEMBL10306727 0.66 TSHR (0.36)
SCHEMBL14257739 0.63
SCHEMBL30403459 0.63
SCHEMBL18932271 0.60
SCHEMBL3431437 0.60 GRIK1 (0.32)
SCHEMBL8197611 0.59
SCHEMBL14256160 0.59
SCHEMBL19265612 0.57

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020066137-A1 RESIN COMPOSITION, CURED FILM, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN CURED FILM AND MANUFACTURING METHOD THEREFOR, SEMICONDUCTOR ELEMENT, AND ELECTRONIC DEVICE 日立化成株式会社 2020-04-02 WO disclosed