SCHEMBL218773

SCHEMBL218773

C=Cc1cccc(OCC)c1OCC

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GSK3A P49840 1/20 0.42
ALDH1A1 P00352 4/20 0.41
L3MBTL1 Q9Y468 5/20 0.41
GLA P06280 1/20 0.41
CHRM2 P08172 2/20 0.40
TSHR P16473 2/20 0.40
ALOX15 P16050 2/20 0.40
LMNA P02545 1/20 0.40
CHRM1 P11229 1/20 0.40
ACHE P22303 1/20 0.40
KCNH2 Q12809 1/20 0.40
HIF1A Q16665 1/20 0.40
KMT2A Q03164 4/20 0.39
NPC1 O15118 3/20 0.39
MEN1 O00255 3/20 0.39
AGTR1 P30556 1/20 0.39
ATM Q13315 1/20 0.39
TP53 P04637 1/20 0.39
MAPT P10636 3/20 0.38
RAB9A P51151 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16957801 0.90 CHRM2 (0.42) GSK3AALDH1A1L3MBTL1CHRM2TSHR
SCHEMBL16954031 0.89 GSK3A (0.52) GSK3AALDH1A1NPC1MAPTRAB9A
SCHEMBL16960320 0.89 NPC1 (0.49) GSK3AALDH1A1L3MBTL1GLAKMT2A
SCHEMBL16960631 0.88 NQO1 (0.37) GSK3AALDH1A1L3MBTL1GLACHRM2
SCHEMBL16955984 0.87 CHRM2 (0.41) GSK3AALDH1A1L3MBTL1CHRM2TSHR
SCHEMBL16958274 0.86 GSK3A (0.36) GSK3AALDH1A1L3MBTL1CHRM2TSHR
SCHEMBL16953917 0.85 GSK3A (0.38) GSK3AALDH1A1L3MBTL1GLACHRM2
SCHEMBL766442 0.85 NPC1 (0.50) GSK3AALDH1A1L3MBTL1LMNAKMT2A
SCHEMBL16956744 0.84 GSK3A (0.37) GSK3AALDH1A1L3MBTL1GLAHPGD
SCHEMBL16952603 0.84 MEN1 (0.40) GSK3AALDH1A1L3MBTL1GLACHRM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1465877-B1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING AZ ELECTRONIC MATERIALS USA (US) 2008-09-24 EP claimed
EP-1960837-A2 DEVELOPABLE UNDERCOATING COMPOSITION FOR THICK PHOTORESIST LAYERS AZ Electronic Materials USA Corp. (US) 2008-08-27 EP claimed
WO-2007054813-A2 DEVELOPABLE UNDERCOATING COMPOSITION FOR THICK PHOTORESIST LAYERS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2007-05-18 WO claimed
US-20070105040-A1 Developable undercoating composition for thick photoresist layers AZ ELECTRONIC MATERIALS USA CORP. 2007-05-10 US claimed
US-6844131-B2 Positive-working photoimageable bottom antireflective coating CLARIANT FINANCE (BVI) LIMITED (VG) 2005-01-18 US claimed
EP-1465877-A1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING Clariant International Ltd. (CH) 2004-10-13 EP claimed
WO-2003057678-A1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 WO claimed
US-20030129531-A1 Positive-working photoimageable bottom antireflective coating MERCK PATENT GMBH (DE) 2003-07-10 US claimed
US-20240427248-A1 RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION SAMSUNG SDI CO., LTD. (KR) 2024-12-26 US disclosed
EP-2384457-B1 COATING COMPOSITIONS MERCK PATENT GMBH (DE) 2022-07-06 EP disclosed
CN-104137236-B Electronic device insulating layer and method for manufacturing electronic device insulating layer 住友化学株式会社 2016-08-24 CN disclosed
EP-2718379-B1 BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF MERCK PATENT GMBH (DE) 2016-08-17 EP disclosed
US-9146467-B2 Coating compositions MERCK PATENT GMBH (DE) 2015-09-29 US disclosed
EP-2900645-A1 3-PHENYLISOXAZOLIN DERIVATIVES WITH HERBICIDAL ACTION Bayer CropScience AG (DE) 2015-08-05 EP disclosed
EP-0617455-B1 Semiconductor device fabrication method MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 2002-01-16 EP disclosed
US-5472826-A Semiconductor device fabrication method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1995-12-05 US disclosed
EP-0617455-A2 Semiconductor device fabrication method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1994-09-28 EP disclosed
US-5326489-A Sulfonated polymer NIPPON SHOKUBAI CO., LTD. (JP) 1994-07-05 US disclosed
EP-0523300-B1 Electrorheological fluids NIPPON CATALYTIC CHEM IND (JP) 1994-01-19 EP disclosed
EP-0523300-A1 Electrorheological fluids NIPPON SHOKUBAI KAGAKU KOGYO CO. LTD. (JP) 1993-01-20 EP disclosed