SCHEMBL21879256

SCHEMBL21879256

CN([SiH3])[SiH]([SiH](C)C)[SiH](C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL35296 0.57
SCHEMBL16284813 0.54
SCHEMBL16899757 0.53
SCHEMBL28050175 0.53
SCHEMBL16758783 0.52
Hydrochloric Acid SCHEMBL21073904 0.52
SCHEMBL12236592 0.52
Trimethylammonium SCHEMBL5887466 0.52
Ethane SCHEMBL3979179 0.52
Water SCHEMBL27372307 0.52

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200131205-A1 COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM INCLUDING DISILYLAMINE COMPOUND AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE SAME DNF CO., LTD. (KR) 2020-04-30 US disclosed