SCHEMBL21879798

SCHEMBL21879798

CC(C)C(=O)C(C)[PH](=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4650845 0.73
SCHEMBL29096248 0.71
SCHEMBL28997396 0.71
SCHEMBL25173 0.69
Methane SCHEMBL28144392 0.67 TP53 (0.30)
Hydrogen Peroxide SCHEMBL374975 0.66 TP53 (0.47)
SCHEMBL377192 0.66
Water SCHEMBL4085909 0.66 TP53 (0.38)
Water SCHEMBL18229925 0.66
Methyl Alcohol SCHEMBL8763775 0.66 TP53 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020085334-A1 PHOTOCURABLE ADHESIVE COMPOSITION 東亞合成株式会社 2020-04-30 WO disclosed
WO-2020085335-A1 PRODUCTION METHOD FOR 2-CYANOACRYLATE COMPOUND AND PRODUCTION METHOD FOR PHOTOCURABLE ADHESIVE COMPOSITION 東亞合成株式会社 2020-04-30 WO disclosed