SCHEMBL21883709

SCHEMBL21883709

CCCCC1CCC2CC1O2

nearest known ligand 0.35

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.35
EPHX1 P07099 1/20 0.32
ALOX5 P09917 1/20 0.32
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
ALDH1A1 P00352 1/20 0.30
DPP4 P27487 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21440002 0.87 CA1 (0.35) MEN1KMT2A
SCHEMBL21910849 0.86 CYP1A2 (0.34) CYP1A2EPHX1ALOX5MEN1KMT2A
SCHEMBL18553076 0.78
SCHEMBL21903208 0.77 PIK3CD (0.35)
SCHEMBL21903207 0.73 PIK3CD (0.38) MEN1KMT2A
SCHEMBL24449800 0.72 MEN1 (0.35) MEN1KMT2A
SCHEMBL12482311 0.72 MEN1 (0.35) MEN1KMT2A
SCHEMBL21164838 0.69 SLC6A4 (0.30)
SCHEMBL23666349 0.68 MEN1 (0.32) MEN1KMT2A
SCHEMBL7118712 0.68 CYP1A2 (0.43) CYP1A2EPHX1ALOX5MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210054231-A1 COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM NISSAN CHEMICAL CORPORATION (JP) 2021-02-25 US disclosed
US-10591817-B2 Method for producing composition for forming coating film for lithography and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-17 US disclosed