⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6761948 | 0.77 | — | — | |
| SCHEMBL19459563 | 0.75 | — | — | |
| SCHEMBL6761674 | 0.74 | — | — | |
| SCHEMBL4964988 | 0.72 | — | — | |
| SCHEMBL4965555 | 0.71 | — | — | |
| SCHEMBL6757901 | 0.69 | — | — | |
| SCHEMBL4812492 | 0.69 | — | — | |
| SCHEMBL7691561 | 0.67 | — | — | |
| SCHEMBL1678555 | 0.63 | — | — | |
| SCHEMBL9342138 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 255 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101034260-A | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD (KR) | 2007-09-12 | — | — | CN | claimed |
| CN-122043858-A | EUV patterned resist formation method | 亚历克斯·P·G·罗宾逊 | 2026-05-15 | — | — | CN | disclosed |
| US-11592605-B2 | Color developing structure having concave-convex layer, method for producing such structure, and display | TOPPAN PRINTING CO., LTD. (JP) | 2023-02-28 | — | — | US | disclosed |
| CN-110095941-B | Photosensitive resin composition and method for producing semiconductor element | 东丽株式会社 | 2023-02-17 | — | — | CN | disclosed |
| CN-107561863-B | Positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2022-09-16 | — | — | CN | disclosed |
| CN-114975098-A | Nanoimprint liquid material, method for producing pattern of cured product, and method for producing circuit board | 佳能株式会社 | 2022-08-30 | — | — | CN | disclosed |
| CN-107251193-B | Nanoimprint liquid material, method for producing pattern of cured product, method for producing optical component, and method for producing circuit board | 佳能株式会社 | 2022-06-21 | — | — | CN | disclosed |
| US-11332597-B2 | Photo-curable composition and patterning method using the same | CANON KABUSHIKI KAISHA (JP) | 2022-05-17 | — | — | US | disclosed |
| CN-114460809-A | Negative photosensitive resin composition, cured film, display device provided with cured film, and method for producing same | 东丽株式会社 | 2022-05-10 | — | — | CN | disclosed |
| CN-109422881-B | Epoxy group-containing isocyanurate-modified silicone resin, photosensitive resin composition, photosensitive dry film, laminate, and pattern formation method | 信越化学工业株式会社 | 2022-04-19 | — | — | CN | disclosed |
| CN-1145078-C | Polymer and resist material | ������ҩ��ҵ��ʽ���� | 2004-04-07 | — | — | CN | disclosed |
| CN-1432873-A | Acid generator, sulfonic acid derivative and radiation-sensitive resin composition | JSR CORP (JP) | 2003-07-30 | — | — | CN | disclosed |
| CN-1388414-A | Material for preservative formation | TOKYO O KAGAKU KOGYO CO LTD (JP) | 2003-01-01 | — | — | CN | disclosed |
| CN-1097073-C | Polymer composition and resist meterial | WAKO PURE CHEM IND LTD (JP) | 2002-12-25 | — | — | CN | disclosed |
| US-6280900-B1 | RADIATION SENSITIVE COMPOSITION WITH ALKALINE DEVELOPER SOLUBLE IN POLYMER COATED ON SUBSTRATE | JSR CORPORATION (JP) | 2001-08-28 | — | — | US | disclosed |
| CN-1287630-A | Positive radiation-sensitive composition | TORAY INDUSTRIES (JP) | 2001-03-14 | — | — | CN | disclosed |
| CN-1278076-A | Agent for lowering dependence of substrate | WAKO PURE CHEM IND LTD (JP) | 2000-12-27 | — | — | CN | disclosed |
| EP-1059314-A1 | A resist composition | Wako Pure Chemical Industries, Ltd. (JP) | 2000-12-13 | — | — | EP | disclosed |
| CN-1263611-A | Method for forming pattern | CLARIANT INT LTD (CH) | 2000-08-16 | — | — | CN | disclosed |
| CN-1159459-A | Polymer composition and resist meterial | WAKO PURE CHEM IND LTD (JP) | 1997-09-17 | — | — | CN | disclosed |