SCHEMBL21935596

SCHEMBL21935596

O=C(c1c(O)cc(O)c(O)c1O)c1c(O)c(O)c(O)c(O)c1O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FFAR1 O14842 3/20 0.43
FASN P49327 2/20 0.41
HDAC1 Q13547 1/20 0.39
KDM4E B2RXH2 4/20 0.39
TDP1 Q9NUW8 4/20 0.39
HPGD P15428 3/20 0.39
ALDH1A1 P00352 3/20 0.39
MAPT P10636 3/20 0.39
LMNA P02545 3/20 0.39
MAPK1 P28482 2/20 0.39
HSD17B10 Q99714 2/20 0.39
FUT7 Q11130 2/20 0.39
CA12 O43570 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
TP53 P04637 1/20 0.39
CA3 P07451 1/20 0.39
SELL P14151 1/20 0.39
SELP P16109 1/20 0.39
FUT4 P22083 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7896049 0.97 FFAR1 (0.44) FFAR1FASNHDAC1KDM4ETDP1
SCHEMBL21935867 0.95 FFAR1 (0.43) FFAR1FASNHDAC1KDM4ETDP1
SCHEMBL21935595 0.89 KDM4E (0.42) FFAR1FASNHDAC1KDM4ETDP1
SCHEMBL21935919 0.88 FASN (0.58) FFAR1FASNKDM4ETDP1HPGD
SCHEMBL21935553 0.86 HDAC1 (0.47) FFAR1FASNHDAC1KDM4ETDP1
SCHEMBL21935539 0.86 PTPN1 (0.46) FFAR1FASNHDAC1KDM4ETDP1
SCHEMBL21936713 0.84 CA1 (0.46) FFAR1FASNHDAC1KDM4ETDP1
SCHEMBL21936695 0.83 KDM4E (0.46) FFAR1FASNHDAC1KDM4ETDP1
SCHEMBL21935534 0.82 FASN (0.62) FFAR1FASNKDM4ETDP1HPGD
SCHEMBL21935549 0.81 PTPN1 (0.46) FFAR1FASNHDAC1KDM4ETDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10894887-B2 Composition for forming film protecting against aqueous hydrogen peroxide solution NISSAN CHEMICAL CORPORATION (JP) 2021-01-19 US disclosed
US-20200131376-A1 COMPOSITION FOR FORMING FILM PROTECTING AGAINST AQUEOUS HYDROGEN PEROXIDE SOLUTION NISSAN CHEMICAL CORPORATION (JP) 2020-04-30 US disclosed