SCHEMBL2195322

SCHEMBL2195322

[CH2]CCCOCCCC[O]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7865175 0.97 MEN1 (0.30)
SCHEMBL668757 0.86
SCHEMBL3682811 0.85 MEN1 (0.32)
SCHEMBL6735629 0.83
SCHEMBL9124662 0.82 MEN1 (0.31)
SCHEMBL14910169 0.82 MEN1 (0.36)
SCHEMBL51000 0.82
SCHEMBL6736949 0.81 MEN1 (0.30)
SCHEMBL6738716 0.81 MEN1 (0.30)
SCHEMBL3161356 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9696626-B2 Composition for forming a resist underlayer film, and pattern-forming method JSR CORPORATION (JP) 2017-07-04 US disclosed
EP-1769079-B1 ENZYMATIC PRODUCTION OF (METH)ACRYLIC ACID ESTERS BASF SE (DE) 2017-06-28 EP disclosed
EP-1773760-B1 CATALYTIC METHODS FOR THE PRODUCTION OF (METH)ACRYLATES FROM N-HYDROXYALKYLATED AMIDES BASF SE (DE) 2017-01-11 EP disclosed
US-20160259247-A1 COMPOSITION FOR FORMING A RESIST UNDERLAYER FILM, AND PATTERN-FORMING METHOD JSR CORPORATION (JP) 2016-09-08 US disclosed
US-9400429-B2 Composition for forming a resist underlayer film, and pattern-forming method JSR CORPORATION (JP) 2016-07-26 US disclosed
EP-2729451-B1 METHOD FOR PRODUCING (METH)ACRYLIC ACID ESTERS BASF SE (DE) 2016-06-22 EP disclosed
US-9150673-B2 Process for preparing (meth)acrylic esters BASF SE (DE) 2015-10-06 US disclosed
EP-2121559-B1 CATALYTIC METHOD FOR PRODUCING (METH)ACRYLIC ACID ESTERS OF N-HYDROXYALKYLATED LACTAMS BASF SE (DE) 2015-08-26 EP disclosed
EP-2899593-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERN FORMING METHOD JSR Corporation (JP) 2015-07-29 EP disclosed
US-20150185613-A1 COMPOSITION FOR FORMING A RESIST UNDERLAYER FILM, AND PATTERN-FORMING METHOD JSR CORPORATION (JP) 2015-07-02 US disclosed
EP-2139940-A1 HYPERBRANCHED POLYESTERS BASF SE (DE) 2010-01-06 EP disclosed
WO-2008113759-A1 HYPERBRANCHED POLYESTERS BASF SE (DE) 2008-09-25 WO disclosed
US-20080200631-A1 Enzymatic Production of (Meth)Acrylic Acid Esters BASF AKTIENGESELLSCHAFT (DE) 2008-08-21 US disclosed
US-20080041273-A1 Scratchproof, Radiation-Curable Coatings BASF COATINGS AKTIENGESELLSCHAFT (DE) 2008-02-21 US disclosed
EP-1831320-A1 SCRATCH-RESISTANT RADIATION CURABLE COATINGS BASF Coatings AG (DE) 2007-09-12 EP disclosed
US-20070123673-A1 CATALYTIC PROCESS FOR PREPARING (METH)ACRYLATES FROM N-HYDROXYALKYLATED LACTAMS BASF AKTIENGESELLSCHAFT (DE) 2007-05-31 US disclosed
WO-2006058680-A1 SCRATCH-RESISTANT RADIATION CURABLE COATINGS BASF COATINGS AG (DE) 2006-06-08 WO disclosed
US-20060036063-A1 Catalyzed preparation of (meth)acrylates of N-hydroxyalkylated amides BASF AKTIENGESELLSCHAFT (DE) 2006-02-16 US disclosed
US-20060009589-A1 Enzymatic preparation of (meth)acrylic esters BASF AKTIENGESELLSCHAFT (DE) 2006-01-12 US disclosed
WO-2004094439-A2 METHOD FOR THE PRODUCTION OF ACYLPHOSPHINES BASF AKTIENGESELLSCHAFT (DE) 2004-11-04 WO disclosed