SCHEMBL21973906

SCHEMBL21973906

CC(O)c1ccc(OC(=O)C(C)(CC(C)(C)C)C(C)(C)C)cc1

nearest known ligand 0.50

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 14/20 0.50
▸ ESR1 P03372 1/20 0.36
▸ HIF1A Q16665 1/20 0.36
▸ SMN1; SMN2 Q16637 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19249584 0.86 ELANE (0.48) ELANEESR1HIF1A
SCHEMBL12058674 0.83 ELANE (0.51) ELANEESR1SMN1; SMN2
SCHEMBL25068947 0.81 ELANE (0.45) ELANESMN1; SMN2
SCHEMBL10250059 0.80 ELANE (0.46) ELANE
SCHEMBL24189681 0.78 ELANE (0.37) ELANE
SCHEMBL15179674 0.77 ELANE (0.54) ELANEESR1HIF1ASMN1; SMN2
SCHEMBL20221022 0.77 ELANE (0.44) ELANESMN1; SMN2
SCHEMBL19266119 0.77 ELANE (0.50) ELANESMN1; SMN2
SCHEMBL13702459 0.75 ELANE (0.49) ELANE
SCHEMBL24405188 0.75 ELANE (0.40) ELANEESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3343292-B1 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2020-05-06 — — EP disclosed
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