SCHEMBL21980780

SCHEMBL21980780

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nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1098027 0.82
SCHEMBL995660 0.82
SCHEMBL6065006 0.82
SCHEMBL995492 0.67
SCHEMBL11661510 0.67
Water SCHEMBL23883552 0.67
SCHEMBL3003962 0.67
SCHEMBL10738102 0.67
SCHEMBL19125141 0.67
SCHEMBL20528081 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11533832-B2 Electromagnetic wave absorbing particle dispersoid and electromagnetic wave absorbing laminated transparent base material SUMITOMO METAL MINING CO., LTD. (JP) 2022-12-20 US disclosed
US-11369048-B2 Electromagnetic-wave-absorbing particles, electromagnetic-wave-absorbing particle dispersion liquids, and manufacturing methods of electromagnetic-wave-absorbing particles SUMITOMO METAL MINING CO., LTD. (JP) 2022-06-21 US disclosed
US-20220046835-A1 ELECTROMAGNETIC WAVE ABSORBING PARTICLE DISPERSOID AND ELECTROMAGNETIC WAVE ABSORBING LAMINATED TRANSPARENT BASE MATERIAL SUMITOMO METAL MINING CO., LTD. (JP) 2022-02-10 US disclosed
US-20200198984-A1 ELECTROMAGNETIC-WAVE-ABSORBING PARTICLES, ELECTROMAGNETIC-WAVE-ABSORBING PARTICLE DISPERSION LIQUIDS, AND MANUFACTURING METHODS OF ELECTROMAGNETIC-WAVE-ABSORBING PARTICLES SUMITOMO METAL MINING CO., LTD. (JP) 2020-06-25 US disclosed
EP-3666731-A1 ELECTROMAGNETIC-WAVE-ABSORBING PARTICLES, ELECTROMAGNETIC-WAVE-ABSORBING PARTICLE DISPERSION, AND METHOD FOR MANUFACTURING ELECTROMAGNETIC-WAVE-ABSORBING PARTICLES Sumitomo Metal Mining Co., Ltd. (JP) 2020-06-17 EP disclosed
EP-3666732-A1 ELECTROMAGNETIC WAVE-ABSORBING PARTICLE DISPERSION AND ELECTROMAGNETIC WAVE-ABSORBING TRANSPARENT LAMINATED SUBSTRATE Sumitomo Metal Mining Co., Ltd. (JP) 2020-06-17 EP disclosed
US-20200170150-A1 ELECTROMAGNETIC WAVE ABSORBING PARTICLE DISPERSOID AND ELECTROMAGNETIC WAVE ABSORBING LAMINATED TRANSPARENT BASE MATERIAL SUMITOMO METAL MINING CO., LTD. (JP) 2020-05-28 US disclosed
CN-110997572-A Electromagnetic wave absorbing particles, electromagnetic wave absorbing particle dispersion liquid, and method for producing electromagnetic wave absorbing particles 住友金属矿山株式会社 2020-04-10 CN disclosed
CN-110997571-A Electromagnetic wave absorbing particle dispersion and laminated transparent substrate for electromagnetic wave absorption 住友金属矿山株式会社 2020-04-10 CN disclosed