SCHEMBL22000893

SCHEMBL22000893

O=S(=O)(CC(F)(F)F)C(S(=O)(=O)CC(F)(F)F)S(=O)(=O)C(F)(F)F

nearest known ligand 0.30

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30
CA7 P43166 1/20 0.30
CA13 Q8N1Q1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL108482 0.76 CA1 (0.41) CA1CA2CA7CA13
SCHEMBL15267708 0.76 CA1 (0.32) CA1CA2CA7CA13
SCHEMBL14219800 0.74 EPHX1 (0.34) CA1CA2CA7CA13
Hydrogen Sulfide SCHEMBL29555265 0.74 CA1 (0.39) CA1CA2CA7CA13
Ammonia Solution, Strong SCHEMBL31709538 0.74 CA1 (0.39) CA1CA2CA7CA13
SCHEMBL7620589 0.74 CA1 (0.39) CA1CA2CA7CA13
Lithium SCHEMBL29624274 0.74 CA1 (0.39) CA1CA2CA7CA13
Potassium SCHEMBL29714737 0.74 CA1 (0.39) CA1CA2CA7CA13
SCHEMBL438535 0.74 CA1 (0.39) CA1CA2CA7CA13
Iodide SCHEMBL29482281 0.74 CA1 (0.39) CA1CA2CA7CA13

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11754926-B2 Method of forming resist pattern, resist composition and method of producing the same TOKYO OHKA KOGYO CO., LTD. (JP) 2023-09-12 US disclosed
US-20200150541-A1 METHOD OF FORMING RESIST PATTERN, RESIST COMPOSITION AND METHOD OF PRODUCING THE SAME TOKYO OHKA KOGYO CO., LTD. (JP) 2020-05-14 US disclosed