SCHEMBL2200436

SCHEMBL2200436

C=C(C)C(=O)OC(C)OC(=O)CC#N

nearest known ligand 0.39

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.39
MCL1 Q07820 3/20 0.34
ALDH1A1 P00352 2/20 0.33
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11440716 0.82 TSHR (0.39) TSHRMCL1
SCHEMBL9160879 0.81 TSHR (0.47) TSHRALDH1A1THRB
SCHEMBL5846106 0.80 TSHR (0.33) TSHRMCL1ALDH1A1THRB
SCHEMBL384674 0.80 TSHR (0.45) TSHRALDH1A1THRB
SCHEMBL7976584 0.79 TSHR (0.33) TSHRALDH1A1
SCHEMBL538063 0.79 TSHR (0.50) TSHRALDH1A1THRB
SCHEMBL250511 0.78 TSHR (0.44) TSHRALDH1A1THRB
SCHEMBL7547628 0.78 TSHR (0.44) TSHRALDH1A1THRB
SCHEMBL22321687 0.77 MCL1 (0.37) MCL1
SCHEMBL6904341 0.77 TSHR (0.48) TSHRALDH1A1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110229549-B High-temperature-resistant insulating composition, insulating coating, and preparation method and application thereof 全球能源互联网研究院有限公司 2021-05-18 CN claimed
EP-0492210-B1 Polymer-coated concrete BASF AG (DE) 1994-09-21 EP claimed
US-5215827-A Acrylic amide or ester copolymers BASF AKTIENGESELLSCHAFT (DE) 1993-06-01 US claimed
US-5213901-A Paint binder containing a film former and polymeric composition ROHM AND HAAS COMPANY (US) 1993-05-25 US claimed
CN-114807559-B Low-loss low-magnetostriction oriented silicon steel material and preparation method thereof 国网智能电网研究院有限公司 2023-07-18 CN disclosed
CN-114807559-A Low-loss low-magnetostriction oriented silicon steel material and preparation method thereof 国网智能电网研究院有限公司 2022-07-29 CN disclosed
CN-110229549-B High-temperature-resistant insulating composition, insulating coating, and preparation method and application thereof 全球能源互联网研究院有限公司 2021-05-18 CN disclosed
CN-110229549-B High-temperature-resistant insulating composition, insulating coating, and preparation method and application thereof 全球能源互联网研究院有限公司 2021-05-18 CN disclosed
US-7976914-B2 Resin film, production method thereof, polarizing plate and liquid crystal display device FUJIFILM CORPORATON (JP) 2011-07-12 US disclosed
US-7847888-B2 Liquid crystal display device including protective films having predetermined moisture permeability characteristics FUJIFILM CORPORATION (JP) 2010-12-07 US disclosed
US-20080241524-A1 Protective Film, Polarizing Plate, and Liquid Crystal Display Device FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080218666-A1 Liquid crystal display device FUJIFILM CORPORATION (JP) 2008-09-11 US disclosed
US-4497929-A Latex compositions comprising loadable polymeric particles EASTMAN KODAK COMPANY (US) 1985-02-05 US disclosed
US-4448850-A PHOTOGRAPHIC ELEMENTS EASTMAN KODAK COMPANY (US) 1984-05-15 US disclosed
US-4443514-A Magnetic recording medium FUJI PHOTO FILM CO., LTD. (JP) 1984-04-17 US disclosed
US-4429039-A SUBBING LAYER CONTAINING AN ADDITION COPOLYMER AND A DICHLORO-2-TRIAZINE DERIVATIVE FUJI PHOTO FILM CO., LTD. (JP) 1984-01-31 US disclosed
US-4201589-A ACRYLIC ESTER POLYMER FUJI PHOTO FILM CO., LTD. (JP) 1980-05-06 US disclosed
US-4125636-A Desensitizing composition and desensitizing method FUJI PHOTO FILM CO., LTD. (JP) 1978-11-14 US disclosed
US-4065435-A OXIDATION-REDUCTION PROPERTIES, ACRYLIC FUJI PHOTO FILM CO., LTD. (JA) 1977-12-27 US disclosed
US-4054722-A PHOTOGRAPHY FUJI PHOTO FILM CO., LTD. (JA) 1977-10-18 US disclosed