⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2201308 | 1.00 | — | — | |
| SCHEMBL3782950 | 0.98 | — | — | |
| SCHEMBL1459368 | 0.98 | — | — | |
| SCHEMBL7613615 | 0.75 | — | — | |
| SCHEMBL5513650 | 0.75 | — | — | |
| SCHEMBL8162371 | 0.71 | — | — | |
| SCHEMBL8518194 | 0.71 | — | — | |
| SCHEMBL28083239 | 0.71 | — | — | |
| SCHEMBL4810810 | 0.71 | — | — | |
| SCHEMBL4810802 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2011123368-A1 | SURFACE CLEANING AND SELECTIVE DEPOSITION OF METAL-CONTAINING CAP LAYERS FOR SEMICONDUCTOR DEVICES | TOKYO ELECTRON LIMITED (JP) | 2011-10-06 | — | — | WO | disclosed |
| US-7977235-B2 | Method for manufacturing a semiconductor device with metal-containing cap layers | TOKYO ELECTRON LIMITED (JP) | 2011-07-12 | — | — | US | disclosed |
| US-7098144-B2 | Heating (methylcyclopentadienyl)(1,5-cyclooctadiene)iridium(I) precursor; mixing with carrier gas; oxidation; chemical vapor deposition; clustered growth | SHARP LABORATORIES OF AMERICA, INC. (US) | 2006-08-29 | — | — | US | disclosed |
| US-20060099758-A1 | Iridium oxide nanotubes and method for forming same | SHARP LABORATORIES OF AMERICA, INC. | 2006-05-11 | — | — | US | disclosed |