SCHEMBL220283

SCHEMBL220283

[CH2]C[CH]CCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1996922 0.80
SCHEMBL1267617 0.78
SCHEMBL43457 0.76
SCHEMBL83477 0.76
SCHEMBL974751 0.76
SCHEMBL11539871 0.76 TSHR (0.55)
SCHEMBL22157932 0.76 TSHR (0.55)
SCHEMBL21463248 0.76 TSHR (0.55)
SCHEMBL1758379 0.76
SCHEMBL11875184 0.76 TSHR (0.55)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1196 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230203695-A1 Alkaline Composition For Copper Electroplating Comprising A Defect Reduction Agent BASF SE (DE) 2023-06-29 US claimed
CN-114059125-A Cobalt plating compositions comprising additives for void-free sub-micron structure filling 巴斯夫欧洲公司 2022-02-18 CN claimed
CN-109477234-B Cobalt plating compositions comprising additives for void-free sub-micron structure filling 巴斯夫欧洲公司 2021-12-10 CN claimed
EP-3885475-A1 COMPOSITION FOR COBALT PLATING COMPRISING ADDITIVE FOR VOID-FREE SUBMICRON FEATURE FILLING BASF SE (DE) 2021-09-29 EP claimed
EP-3485069-B1 COMPOSITION FOR COBALT PLATING COMPRISING ADDITIVE FOR VOID-FREE SUBMICRON FEATURE FILLING BASF SE (DE) 2021-04-28 EP claimed
US-20210040635-A1 COMPOSITION FOR COBALT PLATING COMPRISING ADDITIVE FOR VOID-FREE SUBMICRON FEATURE FILLING BASF SE (DE) 2021-02-11 US claimed
US-20190226107-A1 COMPOSITION FOR COBALT PLATING COMPRISING ADDITIVE FOR VOID-FREE SUBMICRON FEATURE FILLING BASF SE (DE) 2019-07-25 US claimed
CN-109477234-A Cobalt plating compositions comprising additives for void-free sub-micron structure filling 巴斯夫欧洲公司 2019-03-15 CN claimed
EP-2147073-B1 COMPOSITION FOR ANTI-GLARE FILM AND ANTI-GLARE FILM PREPARED USING THE SAME LG CHEMICAL LTD (KR) 2016-06-22 EP claimed
EP-2038353-B1 UV-CURABLE ANTIREFLECTIVE COATING COMPOSITION, ANTIREFLECTIVE COATING FILM USING THE SAME, AND ITS MANUFACTURING METHOD LG CHEMICAL LTD (KR) 2010-03-31 EP claimed
US-20100059158-A1 TIRE FOR VEHICLE WHEELS COMPRISING AN IMPROVED ELASTOMERIC COMPONENT PIRELLI TYRE S.P.A 2010-03-11 US claimed
EP-2077951-A1 TIRE FOR VEHICLE WHEELS COMPRISING AN IMPROVED ELASTOMERIC COMPONENT Pirelli Tyre S.p.A. (IT) 2009-07-15 EP claimed
WO-2008052572-A1 TIRE FOR VEHICLE WHEELS COMPRISING AN IMPROVED ELASTOMERIC COMPONENT PIRELLI TYRE S.P.A. (IT) 2008-05-08 WO claimed
US-6469220-B2 MONOMERS FOR PHOTORESIST MATERIALS WITH HIGH TRANSPARENCY AND A GREAT AFFINITY FOR THE SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-10-22 US claimed
WO-2000021938-A1 SUBSTITUTED HERBICIDAL FORMYLAMINOTRIAZINES BAYER AKTIENGESELLSCHAFT (DE) 2000-04-20 WO claimed
EP-0367019-B1 PHARMACEUTICAL COMPOSITIONS CONTAINING NITROXYALKYL AMINE WITH AN AMIDE FUNCTION, AND METHOD FOR THE PREPARATION OF THE COMPOUNDS Roche Diagnostics GmbH (DE) 1993-05-12 EP claimed
US-5037849-A For treatment of heart and circulatory diseases BOEHRINGER MANNHEIM GMBH (DE) 1991-08-06 US claimed
EP-0367019-A1 Pharmaceutical compositions containing nitroxyalkyl amine with an amide function, and method for the preparation of the compounds Roche Diagnostics GmbH (DE) 1990-05-09 EP claimed
US-20240226132-A1 RNA COMPOSITIONS COMPRISING A BUFFER SUBSTANCE AND METHODS FOR PREPARING, STORING AND USING THE SAME BIONTECH DELIVERY TECHNOLOGIES GMBH (DE) 2024-07-11 US disclosed
US-3984555-A HAVING HYPOTENSIVE, ANTIHISTAMINIC, AND ANALGESIC ACTIONS BYK GULDEN LOMBERG CHEMISCHE FABRIK GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DT) 1976-10-05 US disclosed