⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8332544 | 1.00 | — | — | |
| SCHEMBL8331229 | 0.82 | — | — | |
| SCHEMBL264351 | 0.82 | — | — | |
| SCHEMBL20477583 | 0.81 | — | — | |
| SCHEMBL5367090 | 0.80 | — | — | |
| SCHEMBL28905603 | 0.80 | — | — | |
| SCHEMBL2938001 | 0.80 | — | — | |
| SCHEMBL5024991 | 0.76 | — | — | |
| SCHEMBL3389173 | 0.74 | — | — | |
| SCHEMBL8147266 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116694156-A | Antifouling paint composition for ships and preparation method thereof | 苏州鑫新海运有限公司 | 2023-09-05 | — | — | CN | claimed |
| US-5651921-A | Process for preparing a water repellent silica sol | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1997-07-29 | — | — | US | claimed |
| EP-3410468-B1 | N-TYPE SEMICONDUCTOR ELEMENT, COMPLEMENTARY TYPE SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME, AND WIRELESS COMMUNICATION DEVICE IN WHICH THE SAME IS USED | TORAY INDUSTRIES (JP) | 2024-07-10 | — | — | EP | disclosed |
| EP-3382751-B1 | FERROELECTRIC MEMORY ELEMENT, METHOD FOR PRODUCING SAME, MEMORY CELL USING FERROELECTRIC MEMORY ELEMENT, AND RADIO COMMUNICATION DEVICE USING FERROELECTRIC MEMORY ELEMENT | TORAY INDUSTRIES (JP) | 2023-09-13 | — | — | EP | disclosed |
| EP-3514822-B1 | METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING WIRELESS COMMUNICATION DEVICE | TORAY INDUSTRIES (JP) | 2023-04-26 | — | — | EP | disclosed |
| CN-108292630-B | Ferroelectric memory element, method for manufacturing the same, memory cell using the same, and wireless communication device using the same | 东丽株式会社 | 2023-04-25 | — | — | CN | disclosed |
| US-11616453-B2 | Integrated circuit, method for manufacturing same, and radio communication device using same | TORAY INDUSTRIES, INC. (JP) | 2023-03-28 | — | — | US | disclosed |
| EP-3706166-B1 | INTEGRATED CIRCUIT, METHOD FOR MANUFACTURING SAME, AND RADIO COMMUNICATION DEVICE USING SAME | TORAY INDUSTRIES (JP) | 2023-02-08 | — | — | EP | disclosed |
| CN-112368611-B | Resin composition, light-shielding film, method for producing light-shielding film, and substrate with partition | 东丽株式会社 | 2022-11-22 | — | — | CN | disclosed |
| CN-115356873-A | Resin composition, light-shielding film, method for producing light-shielding film, and substrate with partition | 东丽株式会社 | 2022-11-18 | — | — | CN | disclosed |
| US-11094899-B2 | Method for manufacturing field effect transistor and method for manufacturing wireless communication device | TORAY INDUSTRIES, INC. | 2021-08-17 | — | — | US | disclosed |
| US-20050257335-A1 | Composition for application to the skin, to the lips, to the nails, and/or to hair | L'OREAL S.A. (FR) | 2005-11-24 | — | — | US | disclosed |
| US-20050260146-A1 | Set of at least two solid compositions for application to the skin, to the lips, to the nails, and/or to hair | L'OREAL S.A. (FR) | 2005-11-24 | — | — | US | disclosed |
| US-20050238979-A1 | Compositions for application to the skin, to the lips, to the nails, and/or to hair | L'OREAL S.A. (FR) | 2005-10-27 | — | — | US | disclosed |
| EP-1545437-A1 | COMPOSITION INTENDED TO BE APPLIED TO THE SKIN AND THE INTEGUMENTS | L'OREAL (FR) | 2005-06-29 | — | — | EP | disclosed |
| WO-2004030640-A1 | COMPOSITION INTENDED TO BE APPLIED TO THE SKIN AND THE INTEGUMENTS | L'OREAL (FR) | 2004-04-15 | — | — | WO | disclosed |
| EP-0475132-B1 | Water repellent silica sol and process for preparing the same | IDEMITSU KOSAN CO (JP) | 1998-06-10 | — | — | EP | disclosed |
| US-5651921-A | Process for preparing a water repellent silica sol | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1997-07-29 | — | — | US | disclosed |
| EP-0768352-A1 | MATERIAL FOR FORMING SILICA-BASE COATED INSULATION FILM, PROCESS FOR PRODUCING THE MATERIAL, SILICA-BASE INSULATION FILM, SEMICONDUCTOR DEVICE, AND PROCESS FOR PRODUCING THE DEVICE | HITACHI CHEMICAL CO., LTD. (JP) | 1997-04-16 | — | — | EP | disclosed |
| EP-0475132-A1 | Water repellent silica sol and process for preparing the same | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-03-18 | — | — | EP | disclosed |