SCHEMBL220798

SCHEMBL220798

[AlH3].[GeH4]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL15814350 0.82
SCHEMBL17867721 0.82
SCHEMBL183967 0.82
SCHEMBL1921974 0.82
SCHEMBL2227756 0.82
SCHEMBL2044172 0.82
SCHEMBL10704290 0.82
Phosphine SCHEMBL10533236 0.82
SCHEMBL22466876 0.82
SCHEMBL9857899 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1908 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260110824-A1 ANTI-REFLECTIVE FILM, DISPLAY DEVICE INCLUDING THE SAME, AND ELECTRONIC DEVICE INCLUDING THE SAME SAMSUNG DISPLAY CO LTD (KR) 2026-04-23 US claimed
US-12593488-B2 Compound semiconductor devices combined in a face-to-face arrangement ANALOG DEVICES, INC. (US) 2026-03-31 US claimed
US-12515943-B2 Foundry-compatible through silicon via process for integrated micro-speaker and microphone VIBRANT MICROSYSTEMS INC. (US) 2026-01-06 US claimed
US-20260005670-A1 FBAR STRUCTURE HAVING SINGLE CRYSTALLINE PIEZOELECTRIC LAYER AND FABRICATING METHOD THEREOF SHENZHEN NEWSONIC TECH CO LTD (CN) 2026-01-01 US claimed
US-20250353736-A1 SEMICONDUCTOR STRUCTURE AND METHOD OF MAKING TAIWAN SEMICONDUCTOR MFG CO LTD (TW) 2025-11-20 US claimed
US-12459004-B2 Micromechanical component for a sound transducer and corresponding production method ROBERT BOSCH GMBH (DE) 2025-11-04 US claimed
US-12454455-B2 Semiconductor structure and method of making TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED (TW) 2025-10-28 US claimed
CN-120136021-A Touch sensor based on TSV switching 杭州电子科技大学 2025-06-13 CN claimed
CN-222895347-U Evaporation type condenser 浙江盾安机电科技有限公司 2025-05-23 CN claimed
EP-3757884-B1 INTEGRATED PIEZOELECTRIC MICROELECTROMECHANICAL ULTRASOUND TRANSDUCER (PMUT) ON INTEGRATED CIRCUIT (IC) FOR FINGERPRINT SENSING INVENSENSE INC (US) 2025-04-16 EP claimed
US-5225633-A Bridge chip interconnect system THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) 1993-07-06 US claimed
US-5213877-A Ceramic foundation with aluminum alloys MITSUBISHI MATERIALS CORPORATION (JP) 1993-05-25 US claimed
US-5196274-A Electrolytic cell, aluminum and mercury amalgam anode POPRAVSKY WALLACE N (US) 1993-03-23 US claimed
US-5130498-A Aluminum nitride, aluminum alloy, bonding layer, resistance against thermal stress MITSUBISHI METAL CORPORATION (JP) 1992-07-14 US claimed
US-5121174-A Gate-to-ohmic metal contact scheme for III-V devices VITESSE SEMICONDUCTOR CORPORATION (US) 1992-06-09 US claimed
EP-0455229-A2 Ceramic substrate used for fabricating electric or electronic circuit MITSUBISHI MATERIALS CORPORATION (JP) 1991-11-06 EP claimed
EP-0135230-B1 SEMICONDUCTOR DEVICE, IN PARTICULAR A TRANSISTOR INCLUDING A PROTECTION MEANS AGAINST OVERVOLTAGE RTC-COMPELEC (FR) 1987-11-19 EP claimed
US-4635091-A Semiconductor device having overload protection U.S. PHILIPS CORPORATION (US) 1987-01-06 US claimed
EP-0135230-A1 Semiconductor device, in particular a transistor including a protection means against overvoltage RTC-COMPELEC (FR) 1985-03-27 EP claimed
US-4223434-A Method of manufacturing a niobium-aluminum-germanium superconductive material THE UNITED STATES OF AMERICA AS REPRESENTED BY THE UNITED STATES DEPARTMENT OF ENERGY (US) 1980-09-23 US claimed