SCHEMBL22091925

SCHEMBL22091925

CC(C(Cl)C(=O)O)C(C)(C)C

nearest known ligand 0.38

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.38
TP53 P04637 1/20 0.36
SLC7A5 Q01650 1/20 0.36
ALDH1A1 P00352 3/20 0.35
MAPT P10636 1/20 0.32
PTGS1 P23219 1/20 0.32
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7813158 0.77
SCHEMBL50413 0.77
SCHEMBL4970328 0.77
Hydrochloric Acid SCHEMBL9407186 0.75
Hydrochloric Acid SCHEMBL9407188 0.75
SCHEMBL8734218 0.72 TP53 (0.40) TP53SLC7A5ALDH1A1MAPTPTGS1
SCHEMBL2464055 0.72 TP53 (0.40) TP53SLC7A5ALDH1A1MAPTPTGS1
SCHEMBL7516481 0.71
SCHEMBL7517335 0.71
SCHEMBL7517474 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020121384-A1 PHOTOPOLYMERIZATION SENSITIZER HAVING MIGRATION RESISTANCE 川崎化成工業株式会社 2020-06-18 WO disclosed