⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22840906 | 1.00 | — | — | |
| SCHEMBL20468459 | 1.00 | — | — | |
| SCHEMBL685977 | 1.00 | — | — | |
| SCHEMBL21235007 | 1.00 | — | — | |
| SCHEMBL26060529 | 0.92 | — | — | |
| SCHEMBL22840994 | 0.92 | — | — | |
| SCHEMBL12014819 | 0.92 | — | — | |
| SCHEMBL17247237 | 0.91 | — | — | |
| SCHEMBL14666506 | 0.90 | — | — | |
| SCHEMBL12974554 | 0.89 | TSHR (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020129476-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | 富士フイルム株式会社 | 2020-06-25 | — | — | WO | disclosed |