SCHEMBL2214101

SCHEMBL2214101

CC(S)C(=O)O.C[Sn]C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12149426 0.89
SCHEMBL946721 0.89 TDP1 (0.53)
SCHEMBL15864 0.89
SCHEMBL2128694 0.89
Ammonia Solution, Strong SCHEMBL2306139 0.86
SCHEMBL22091413 0.86
SCHEMBL8218693 0.86
SCHEMBL22091511 0.86
SCHEMBL10944662 0.86
Hydrochloric Acid SCHEMBL7710547 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0748658-B1 A method for manufacturing a chemically adsorbed film and a chemical adsorbent solution for the method MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 2002-09-18 EP claimed
US-6280517-B1 ALKOXYSILANE SURFACE ACTIVE AGENT IN SOLVENT MATUSHITA ELECTRIC INDUSTRIAL CO. LTD. (JP) 2001-08-28 US claimed
US-20010005531-A1 Method for manufacturing a chemically adsorbed film and a chemical adsorbent solution for the method OGAWA KAZUFUMI (JP) 2001-06-28 US claimed
US-5907013-A MIXTURE OF SURFACTANTS, NONAQUEOUS SOLVENT AND CATALYST MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1999-05-25 US claimed
US-5849369-A Method for manufacturing a chemically adsorbed film and a chemical adsorbent solution for the method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1998-12-15 US claimed
EP-0748658-A2 A method for manufacturing a chemically adsorbed film and a chemical adsorbent solution for the method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD (JP) 1996-12-18 EP claimed
US-9180206-B2 Pharmaceutical preparation and manufacturing method thereof EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) 2015-11-10 US disclosed
US-20140302325-A1 SURFACE-COVERED INORGANIC POWDER NIPPON SODA CO., LTD. (JP) 2014-10-09 US disclosed
EP-2769959-A1 SURFACE-COVERED INORGANIC POWDER Nippon Soda Co., Ltd. (JP) 2014-08-27 EP disclosed
EP-2707433-A1 COMPOSITION Fresh Formulations Limited (GB) 2014-03-19 EP disclosed
WO-2012156713-A1 COMPOSITION SI LABORATORIES LIMITED (GB) 2012-11-22 WO disclosed
US-20110177057-A1 PHARMACEUTICAL PREPARATION AND MANUFACTURING METHOD THEREOF CRESTLINE DIRECT FINANCE, L.P. 2011-07-21 US disclosed
WO-2008139637-A1 PHARMACEUTICAL PREPARATION AND MANUFACTURING METHOD THEREOF OGAWA KAZUFUMI (JP) 2008-11-20 WO disclosed
US-6060123-A CONTACTING A SUBSTRATE HAVING ACTIVE HYDROGEN GROUPS WITH A SOLUTION OF ALKOXYSILANE SURFACE ACTIVE AGENT, A NONAQUEOUS, ACTIVE HYDROGEN-FREE SOLVENT AND SILANOL-CONDENSING CATALYST TO FORM A MONOMOLECULAR LAYER ON SURFACE VIA SILOXANE BOND MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2000-05-09 US disclosed
US-5998541-A MIXTURE OF SURFACTANT, CATALYST AND NONAQUEOUS SOLVENT MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1999-12-07 US disclosed
US-5907013-A MIXTURE OF SURFACTANTS, NONAQUEOUS SOLVENT AND CATALYST MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1999-05-25 US disclosed
US-5849369-A Method for manufacturing a chemically adsorbed film and a chemical adsorbent solution for the method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1998-12-15 US disclosed
US-5770640-A Finishing agents and method of using the same MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1998-06-23 US disclosed
EP-0748659-A2 Finishing agents and methods of using the same MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD (JP) 1996-12-18 EP disclosed
EP-0748658-A2 A method for manufacturing a chemically adsorbed film and a chemical adsorbent solution for the method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD (JP) 1996-12-18 EP disclosed