SCHEMBL2218707

SCHEMBL2218707

Cc1ccc(O)c(C(=O)OC(C)(C)C)c1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CSNK2A1 P68400 1/20 0.56
EGFR P00533 1/20 0.51
KLF10 Q13118 1/20 0.47
CA12 O43570 3/20 0.45
CA1 P00915 3/20 0.45
CA2 P00918 3/20 0.45
CA7 P43166 3/20 0.45
CA9 Q16790 3/20 0.45
CA14 Q9ULX7 3/20 0.45
P2RX1 P51575 1/20 0.43
TMPRSS4 Q9NRS4 1/20 0.43
MCL1 Q07820 1/20 0.42
RAB9A P51151 2/20 0.42
TRPA1 O75762 1/20 0.42
POLB P06746 1/20 0.42
KDM4E B2RXH2 1/20 0.42
MEN1 O00255 1/20 0.42
LMNA P02545 1/20 0.42
KMT2A Q03164 1/20 0.42
TP53 P04637 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27297355 0.86 NPC1 (0.47) CSNK2A1EGFRCA12CA1CA2
SCHEMBL6351061 0.85 CSNK2A1 (0.41) CSNK2A1EGFRRAB9AMEN1KMT2A
SCHEMBL39335 0.84 CA12 (0.65) EGFRCA12CA1CA2CA7
SCHEMBL14344780 0.84 EGFR (0.52) EGFRCA12CA1CA2CA7
SCHEMBL30227090 0.84 CA12 (0.65) EGFRCA12CA1CA2CA7
SCHEMBL2616107 0.81 CYP3A4 (0.55) EGFRCA12CA1CA2CA7
SCHEMBL8143660 0.81 HPGD (0.56) EGFRCA12CA1CA2CA7
SCHEMBL20570435 0.81 EGFR (0.50) EGFRCA12CA1CA2CA7
SCHEMBL9600264 0.81 EGFR (0.50) CSNK2A1EGFRCA12CA1CA2
SCHEMBL16355744 0.81 CSNK2A1 (0.38) CSNK2A1EGFRRAB9ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110177454-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL PANASONIC CORPORATION (JP) 2011-07-21 US claimed
US-20110177454-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL PANASONIC CORPORATION (JP) 2011-07-21 US disclosed