SCHEMBL2220097

SCHEMBL2220097

FC=S

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17409281 0.72 — —
SCHEMBL863642 0.72 — —
SCHEMBL5135 0.61 — —
SCHEMBL1679908 0.58 — —
SCHEMBL346587 0.58 — —
SCHEMBL56 0.55 — —
SCHEMBL529 0.55 — —
SCHEMBL9173302 0.55 — —
SCHEMBL21072680 0.55 — —
SCHEMBL21835043 0.55 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 204 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120069389-A Hybrid vehicle user energy consumption evaluation system and method based on cloud big data 东风汽车集团股份有限公司 2025-05-30 — — CN claimed
US-12183591-B2 Etching gas compositions, methods of forming micropatterns, and methods of manufacturing semiconductor device SAMSUNG ELECTRONICS CO., LTD. (KR) 2024-12-31 — — US claimed
CN-119161996-A Beauveria bassiana HCSF-Bb001 for preventing and treating solenopsis invicta and application thereof 广西壮族自治区农业科学院 2024-12-20 — — CN claimed
US-20220310407-A1 ETCHING GAS COMPOSITIONS, METHODS OF FORMING MICROPATTERNS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE Wonik Materials (KR) 2022-09-29 — — US claimed
CN-114149353-A N-alkyl/N-aryl thioamide derivatives and synthesis method and application thereof 华东师范大学 2022-03-08 — — CN claimed
CN-113999813-A Primary culture method of umbilical cord mesenchymal stem cells 云南和泽西南生物科技有限公司 2022-02-01 — — CN claimed
US-4656108-A Patterned film of thiocarbonyl fluoride polymer DAIKIN KOGYO CO., LTD. (JP) 1987-04-07 — — US claimed
EP-0068488-B1 RESIST AND PROCESS FOR FORMING RESIST PATTERN Daikin Kogyo Co., Ltd. (JP) 1985-06-12 — — EP claimed
US-4508603-A Fluorinated cation exchange membrane and use thereof in electrolysis of an alkali metal halide ASAHI GLASS COMPANY LTD. (JP) 1985-04-02 — — US claimed
EP-0068488-A1 Resist and process for forming resist pattern Daikin Kogyo Co., Ltd. (JP) 1983-01-05 — — EP claimed
JP-9260370-A — — None — — JP disclosed
JP-9162184-A — — None — — JP disclosed
JP-10144792-A — — None — — JP disclosed
JP-6112172-A — — None — — JP disclosed
EP-4720033-A1 PROCESS FOR TRAPPING THIOCARBONYL FLUORIDE Centre National de la Recherche Scientifique (FR) 2026-04-08 — — EP disclosed
EP-0008862-A1 Electrical device with a divalent sulfur dielectric gas and a composition comprising divalent sulfur ALLIED CORPORATION (US) 1980-03-19 — — EP disclosed
US-4166798-A Electrical device with fluorinated divalent sulfur dielectric gas ALLIED CHEMICAL CORPORATION (US) 1979-09-04 — — US disclosed
US-4003868-A AMINO RESIN, EPOXIDIZED FATTY OIL ESTER, ACRYLIC ESTER, POLYMERIZATION CATALYST UNION CARBIDE CORPORATION (US) 1977-01-18 — — US disclosed
US-3940402-A POLYMERIZATION CATALYSTS E. I. DUPONT DE NEMOURS AND COMPANY (US) 1976-02-24 — — US disclosed
US-3935330-A Two-step coating process UNION CARBIDE CORPORATION (US) 1976-01-27 — — US disclosed
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