SCHEMBL2222564

SCHEMBL2222564

O=C1CC=CC=C1Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5848037 0.72
SCHEMBL7395758 0.70
SCHEMBL5565070 0.70
SCHEMBL465869 0.70
SCHEMBL15058384 0.69
SCHEMBL629483 0.69
SCHEMBL2112088 0.68
SCHEMBL3360734 0.68
SCHEMBL8144802 0.68
SCHEMBL13214488 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0262062-B1 PROCESS FOR PREPARING CHLOROPHENOLS RHONE-POULENC CHIMIE (FR) 1989-08-23 EP claimed
EP-0262062-A1 Process for preparing chlorophenols RHONE-POULENC CHIMIE (FR) 1988-03-30 EP claimed
CN-110621664-B Novel piperidine-2, 6-dione derivatives and uses thereof 韩国化学研究院 2023-08-01 CN disclosed
US-9221928-B2 Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method CENTRAL GLASS COMPANY, LIMITED (JP) 2015-12-29 US disclosed
US-9182664-B2 Polymerizable fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern-forming method using same CENTRAL GLASS COMPANY, LIMITED (JP) 2015-11-10 US disclosed
US-8993212-B2 Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same CENTRAL GLASS COMPANY, LIMITED (JP) 2015-03-31 US disclosed
US-8663897-B2 Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same CENTRAL GLASS COMPANY, LIMITED (JP) 2014-03-04 US disclosed
US-20130209938-A1 Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And Resist Composition And Pattern Formation Method Utilizing Same CENTRAL GLASS COMPANY, LTD. (JP) 2013-08-15 US disclosed
US-20130209937-A1 Polymerizable Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition And Pattern-Forming Method Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2013-08-15 US disclosed
CN-103159766-A Synthesis method of novel pharmaceutical intermediate JIANGSU WANBANG BIOPHARMACEUTICALS CO LTD 2013-06-19 CN disclosed
US-20120328985-A1 Fluorine-Containing Sulfonate Resin, Fluorine-Containing N-Sulfonyloxyimide Resin, Resist Composition and Pattern Formation Method CENTRAL GLASS COMPANY, LIMITED (JP) 2012-12-27 US disclosed
US-5073465-A High sensitivity and durability FUJI PHOTO FILM CO., LTD. (JP) 1991-12-17 US disclosed
EP-0399403-A1 Electrophotographic photoreceptor FUJI PHOTO FILM CO., LTD. (JP) 1990-11-28 EP disclosed
EP-0262062-B1 PROCESS FOR PREPARING CHLOROPHENOLS RHONE-POULENC CHIMIE (FR) 1989-08-23 EP disclosed
US-4853153-A USING REDUCING AGENT AND CHLORINATED CYCLIC KETONE RHONE-POULENC CHIMIE (FR) 1989-08-01 US disclosed
US-4822922-A WITH PROTONIC AND/OR LEWIS ACID RHONE-POULENC CHIMIE (FR) 1989-04-18 US disclosed
EP-0299892-A1 Process for preparing 2,4,6-trichlorophenol RHONE-POULENC CHIMIE (FR) 1989-01-18 EP disclosed
EP-0262062-A1 Process for preparing chlorophenols RHONE-POULENC CHIMIE (FR) 1988-03-30 EP disclosed
EP-0262062-A1 Process for preparing chlorophenols RHONE-POULENC CHIMIE (FR) 1988-03-30 EP disclosed
EP-0262063-A2 Process for stabilizing chlorination mixtures of phenol and/or chlorophenols RHONE-POULENC CHIMIE (FR) 1988-03-30 EP disclosed