Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | SCN1A | P35498 | 3/20 | 0.32 |
| ▸ | SCN2A | Q99250 | 3/20 | 0.32 |
| ▸ | SCN3A | Q9NY46 | 3/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.31 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.31 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.31 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.31 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.30 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.30 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22277818 | 0.93 | SLC6A2 (0.34) | ATMCHRM4CHRM5CHRM1CHRM3 | |
| SCHEMBL22277817 | 0.87 | POLB (0.30) | — | |
| SCHEMBL22277450 | 0.86 | MAPT (0.42) | KMT2AMEN1 | |
| SCHEMBL22277441 | 0.84 | POLB (0.30) | — | |
| SCHEMBL22277824 | 0.83 | SLC6A2 (0.33) | SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL26426795 | 0.82 | CHRM3 (0.32) | CHRM3 | |
| SCHEMBL24179407 | 0.82 | DPP4 (0.35) | — | |
| SCHEMBL22277825 | 0.81 | — | — | |
| SCHEMBL22277446 | 0.81 | POLB (0.31) | — | |
| SCHEMBL22277822 | 0.81 | POLB (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20200241417-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-30 | — | — | US | disclosed |