⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7630019 | 0.83 | — | — | |
| SCHEMBL9002130 | 0.81 | — | — | |
| SCHEMBL3484345 | 0.80 | — | — | |
| SCHEMBL3462074 | 0.79 | — | — | |
| SCHEMBL3483416 | 0.79 | — | — | |
| SCHEMBL9569112 | 0.78 | — | — | |
| SCHEMBL1017243 | 0.78 | — | — | |
| SCHEMBL9220608 | 0.78 | — | — | |
| SCHEMBL939722 | 0.78 | MEN1 (0.32) | — | |
| SCHEMBL2231208 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2360527-B1 | Patterning process using EB or EUV lithography | SHINETSU CHEMICAL CO (JP) | 2017-08-23 | — | — | EP | disclosed |
| EP-2360525-B1 | Chemically amplified positive resist composition and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2017-08-23 | — | — | EP | disclosed |
| EP-2360526-B1 | Chemically amplified negative resist composition for E beam or EUV lithography and patterning process | SHINETSU CHEMICAL CO (JP) | 2017-08-16 | — | — | EP | disclosed |
| US-9318776-B2 | Nonaqueous electrolyte solution and electricity storage device using same | UBE INDUSTRIES, LTD. (JP) | 2016-04-19 | — | — | US | disclosed |
| US-20150333370-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTRICITY STORAGE DEVICE USING SAME | UBE INDUSTRIES, LTD. (JP) | 2015-11-19 | — | — | US | disclosed |
| EP-2889947-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTRICITY STORAGE DEVICE USING SAME | UBE Industries, Ltd. (JP) | 2015-07-01 | — | — | EP | disclosed |
| US-8546060-B2 | Chemically amplified positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-10-01 | — | — | US | disclosed |
| US-8470511-B2 | Chemically amplified negative resist composition for EB or EUV lithography and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-25 | — | — | US | disclosed |
| US-8426108-B2 | Chemically amplified positive resist composition for EB or EUV lithography and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-23 | — | — | US | disclosed |
| EP-2360525-A1 | Chemically amplified positive resist composition and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2011-08-24 | — | — | EP | disclosed |
| EP-2360526-A1 | Chemically amplified negative resist composition for E beam or EUV lithography and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2011-08-24 | — | — | EP | disclosed |
| EP-2360527-A1 | Chemically amplified positive resist composition for EB or EUV lithography and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2011-08-24 | — | — | EP | disclosed |
| US-20110200941-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR EB OR EUV LITHOGRAPHY AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110200942-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION FOR EB OR EUV LITHOGRAPHY AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110200919-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-18 | — | — | US | disclosed |
| EP-2011811-A1 | ACTIVE RAY CURABLE COMPOSITION, ACTIVE RAY CURABLE INKJET INK, IMAGE FORMING METHOD USING THE ACTIVE RAY CURABLE INKJET INK, AND INKJET RECORDING APPARATUS | Konica Minolta Medical & Graphic, Inc. (JP) | 2009-01-07 | — | — | EP | disclosed |