⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7383676 | 0.70 | — | — | |
| SCHEMBL22754663 | 0.61 | — | — | |
| SCHEMBL2542626 | 0.54 | — | — | |
| SCHEMBL8267240 | 0.53 | — | — | |
| SCHEMBL33269 | 0.53 | — | — | |
| SCHEMBL21928749 | 0.53 | — | — | |
| SCHEMBL13761537 | 0.51 | — | — | |
| SCHEMBL20612590 | 0.51 | — | — | |
| SCHEMBL17581051 | 0.50 | — | — | |
| SCHEMBL5222255 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2360527-B1 | Patterning process using EB or EUV lithography | SHINETSU CHEMICAL CO (JP) | 2017-08-23 | — | — | EP | disclosed |
| EP-2360525-B1 | Chemically amplified positive resist composition and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2017-08-23 | — | — | EP | disclosed |
| EP-2360526-B1 | Chemically amplified negative resist composition for E beam or EUV lithography and patterning process | SHINETSU CHEMICAL CO (JP) | 2017-08-16 | — | — | EP | disclosed |
| US-8546060-B2 | Chemically amplified positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-10-01 | — | — | US | disclosed |
| US-8470511-B2 | Chemically amplified negative resist composition for EB or EUV lithography and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-25 | — | — | US | disclosed |
| US-8426108-B2 | Chemically amplified positive resist composition for EB or EUV lithography and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-23 | — | — | US | disclosed |
| EP-2360525-A1 | Chemically amplified positive resist composition and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2011-08-24 | — | — | EP | disclosed |
| EP-2360526-A1 | Chemically amplified negative resist composition for E beam or EUV lithography and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2011-08-24 | — | — | EP | disclosed |
| EP-2360527-A1 | Chemically amplified positive resist composition for EB or EUV lithography and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2011-08-24 | — | — | EP | disclosed |
| US-20110200941-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR EB OR EUV LITHOGRAPHY AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110200942-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION FOR EB OR EUV LITHOGRAPHY AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110200919-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-18 | — | — | US | disclosed |
| EP-0095571-B1 | POLYHYDRIC ALCOHOL ETHERS OF 2,2,6,6-TETRAMETHYL-4-PIPERIDONE KETALS AND SYNTHETIC RESIN COMPOSITIONS | ADEKA ARGUS CHEMICAL CO., Ltd. (JP) | 1987-09-23 | — | — | EP | disclosed |
| US-4525506-A | DETERIORATION RESISTANCE IN PRESENCE OF LIGHTR | ADEKA ARGUS CHEMICAL CO., LTD. (JP) | 1985-06-25 | — | — | US | disclosed |
| EP-0095571-A2 | Polyhydric alcohol ethers of 2,2,6,6-tetramethyl-4-piperidone ketals and synthetic resin compositions | ADEKA ARGUS CHEMICAL CO., Ltd. (JP) | 1983-12-07 | — | — | EP | disclosed |
| US-4280979-A | POLYESTERURETHANE-ADDITION COPOLYMERS USED FOR MOLDING MATERIALS | UNION CARBIDE CORPORATION (US) | 1981-07-28 | — | — | US | disclosed |
| US-4241199-A | USEFUL IN PREPARING LIGHTWEIGHT POLYESTERURETHANES | UNION CARBIDE CORPORATION (US) | 1980-12-23 | — | — | US | disclosed |