SCHEMBL2232369

SCHEMBL2232369

CO[SiH](COCC1CO1)OC

nearest known ligand 0.47

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.47
MAPK1 P28482 1/20 0.47
SMN1; SMN2 Q16637 2/20 0.45
ALDH1A1 P00352 8/20 0.42
TDP1 Q9NUW8 2/20 0.42
GLA P06280 1/20 0.36
TP53 P04637 3/20 0.31
MAPT P10636 2/20 0.31
HPGD P15428 2/20 0.31
HIF1A Q16665 2/20 0.31
MEN1 O00255 1/20 0.31
CYP1A2 P05177 1/20 0.31
KMT2A Q03164 1/20 0.31
PPARG P37231 1/20 0.31
CYP3A4 P08684 1/20 0.31
PKM P14618 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14524337 0.81 TSHR (0.45) TSHRMAPK1SMN1; SMN2ALDH1A1TDP1
SCHEMBL1868366 0.79 SMN1; SMN2 (0.47) TSHRMAPK1SMN1; SMN2ALDH1A1TDP1
SCHEMBL230992 0.79 TSHR (0.54) TSHRMAPK1SMN1; SMN2ALDH1A1TDP1
SCHEMBL17090758 0.77 SMN1; SMN2 (0.54) TSHRMAPK1SMN1; SMN2ALDH1A1TDP1
SCHEMBL10016119 0.77
SCHEMBL233474 0.76 TSHR (0.61) TSHRMAPK1SMN1; SMN2ALDH1A1TDP1
SCHEMBL4273639 0.76 SMN1; SMN2 (0.53) TSHRMAPK1SMN1; SMN2ALDH1A1TDP1
Methoxymethane SCHEMBL1074158 0.76 TSHR (0.59) TSHRMAPK1SMN1; SMN2ALDH1A1TDP1
SCHEMBL12276046 0.75 TSHR (0.44) TSHRSMN1; SMN2ALDH1A1TDP1MEN1
SCHEMBL28065 0.75 TSHR (0.64) TSHRMAPK1SMN1; SMN2ALDH1A1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 140 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119650776-A Ionic liquid covalent grafted hexagonal boron nitride composite proton exchange membrane and preparation method and application thereof 中国科学院赣江创新研究院 2025-03-18 CN claimed
CN-116075559-B Optical article with low interference fringe and coating agent composition thereof 日本精化株式会社 2023-12-05 CN claimed
CN-1136250-C Crosslinked solid polyelectrolytes and their use ������������ʽ���� 2004-01-28 CN claimed
EP-0620255-B1 Antifogging abrasion resistant coating composition and synthetic resin article coated therewith LUCKY LTD (KR) 2002-02-27 EP claimed
US-5674941-A CURABLE PROTECTIVE COATING FOR OPTICAL ARTICLES COMPRISING AN AMINE-CONTAINING SILANE AND AN ACRYLIC COPOLYMER HAVING PENDANT HYDROXY, EPOXY, AMINO AND/OR SILANE GROUPS; ANTIFOGGING AGENTS; ADHESION TO POLYCARBONATES; NONABRASIVE LUCKY LIMITED (KR) 1997-10-07 US claimed
EP-0620255-A1 Antifogging abrasion resistant coating composition and synthetic resin article coated therewith LUCKY LTD. (KR) 1994-10-19 EP claimed
EP-0226934-A2 Curable organosiloxane composition Toray Silicone Co., Ltd. (JP) 1987-07-01 EP claimed
JP-58126501-A None JP disclosed
JP-63099221-A None JP disclosed
CN-119948595-A Method for producing semiconductor device containing low dielectric constant film 彼博股份有限公司 2025-05-06 CN disclosed
CN-119768742-A Composition for forming silicon-containing resist underlayer film 日产化学株式会社 2025-04-04 CN disclosed
CN-119563142-A Composition for forming silicon-containing resist underlayer film containing multifunctional sulfonic acid 日产化学株式会社 2025-03-04 CN disclosed
CN-119487453-A Method for manufacturing laminate and method for manufacturing semiconductor element 日产化学株式会社 2025-02-18 CN disclosed
US-4642266-A SCRATCH RESISTANCE AND WEATHERABILITY NIPPON SHEET GLASS CO., LTD. (JP) 1987-02-10 US disclosed
US-RE32272-E EPOXY GROUP-CONTAINING SILANE COMPOUND, POLYHDRIC ALCOHOL, POLYMER AND CURING AGENT SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1986-10-28 US disclosed
US-4594379-A Containing an organosilicon compound in photoinitiator blend NIPPON SHEET GLASS CO., LTD. (JP) 1986-06-10 US disclosed
US-4522966-A CURABLE MIXTURE OF GLYCIDYL-CONTAINING ACRYLIC POLYMER, A POLYOXYALKYLENE GLYCOL AND CATALYST NIPPON SHEET GLASS CO., LTD. (JP) 1985-06-11 US disclosed
US-4405679-A ADDITION POLYMER, POLYSILOXANE NIPPON SHEET GLASS CO. LTD. (JP) 1983-09-20 US disclosed
JP-S58126501-A SYNTHETIC RESIN LENS SEIKO EPSON CORP 1983-07-28 JP disclosed
US-4394177-A Coating composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1983-07-19 US disclosed