SCHEMBL22325718

SCHEMBL22325718

c1ccc2c(CCCCCCCCCCCCCCCCCCCCc3c4ccccc4nc4ccccc34)c3ccccc3nc2c1.c1ccc2c(COCc3c4ccccc4nc4ccccc34)c3ccccc3nc2c1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 6/20 0.55
▸ ALDH1A1 P00352 3/20 0.55
▸ HPGD P15428 3/20 0.55
▸ GAA P10253 2/20 0.55
▸ TLR8 Q9NR97 6/20 0.46
▸ GLA P06280 4/20 0.41
▸ POLB P06746 1/20 0.40
▸ HSD17B10 Q99714 3/20 0.39
▸ MAOA P21397 2/20 0.39
▸ ACHE P22303 2/20 0.39
▸ CASP1 P29466 2/20 0.39
▸ CASP7 P55210 2/20 0.39
▸ CHRM2 P08172 1/20 0.39
▸ ADRA2A P08913 1/20 0.39
▸ ADORA3 P0DMS8 1/20 0.39
▸ CHRM1 P11229 1/20 0.39
▸ NQO2 P16083 1/20 0.39
▸ DRD1 P21728 1/20 0.39
▸ SLC6A2 P23975 1/20 0.39
▸ ADRA1A P35348 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL600275 0.89 KDM4E (0.67) KDM4EALDH1A1HPGDGAATLR8
SCHEMBL194341 0.89 KDM4E (0.67) KDM4EALDH1A1HPGDGAATLR8
SCHEMBL194585 0.89 KDM4E (0.67) KDM4EALDH1A1HPGDGAATLR8
SCHEMBL320922 0.89 KDM4E (0.67) KDM4EALDH1A1HPGDGAATLR8
SCHEMBL321523 0.89 KDM4E (0.67) KDM4EALDH1A1HPGDGAATLR8
SCHEMBL599897 0.89 KDM4E (0.67) KDM4EALDH1A1HPGDGAATLR8
SCHEMBL321157 0.89 KDM4E (0.67) KDM4EALDH1A1HPGDGAATLR8
SCHEMBL600971 0.89 KDM4E (0.67) KDM4EALDH1A1HPGDGAATLR8
SCHEMBL601351 0.89 KDM4E (0.67) KDM4EALDH1A1HPGDGAATLR8
SCHEMBL29446764 0.89 KDM4E (0.67) KDM4EALDH1A1HPGDGAATLR8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020162464-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD 日立化成株式会社 2020-08-13 — — WO disclosed
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