SCHEMBL22370100

SCHEMBL22370100

[SiH3]CCCCCCCl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6447352 1.00 TSHR (0.44)
SCHEMBL22370084 1.00 TSHR (0.44)
SCHEMBL8667432 1.00 TSHR (0.44)
SCHEMBL29259770 1.00
SCHEMBL1096013 1.00 TSHR (0.44)
SCHEMBL25173757 1.00 TSHR (0.44)
SCHEMBL27490342 0.96
SCHEMBL618285 0.84
SCHEMBL21828956 0.79
SCHEMBL1567343 0.79 TSHR (0.55)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12163050-B2 Invisible-fingerprint coatings and process for forming same HENKEL AG & CO. KGAA (DE) 2024-12-10 US disclosed
EP-4400551-A1 INVISIBLE-FINGERPRINT COATINGS AND PROCESS FOR FORMING SAME Henkel AG & Co. KGaA (DE) 2024-07-17 EP disclosed
EP-3931269-B1 INVISIBLE-FINGERPRINT COATINGS AND PROCESS FOR FORMING SAME HENKEL AG & CO KGAA (DE) 2024-06-26 EP disclosed
CN-112218728-B Invisible fingerprint coating and forming method thereof NBD纳米技术公司 2024-04-26 CN disclosed
CN-111542550-B Base for forming polymer brush, method for producing the base, and precursor liquid used in the method 国立研究开发法人产业技术综合研究所 2022-07-19 CN disclosed
EP-3931269-A1 INVISIBLE-FINGERPRINT COATINGS AND PROCESS FOR FORMING SAME NBD Nanotechnologies, Inc. (US) 2022-01-05 EP disclosed
EP-3801928-A1 INVISIBLE FINGERPRINT COATINGS AND PROCESS FOR FORMING SAME Nbd Nanotechnologies, Inc. (US) 2021-04-14 EP disclosed
CN-112218728-A Invisible fingerprint coating and forming method thereof NBD纳米技术公司 2021-01-12 CN disclosed
US-20200277513-A1 INVISIBLE-FINGERPRINT COATINGS AND PROCESS FOR FORMING SAME HENKEL AG & CO. KGAA (DE) 2020-09-03 US disclosed
CN-111542550-A Base for forming polymer brush, method for producing the base, and precursor liquid used in the method 国立研究开发法人产业技术综合研究所 2020-08-14 CN disclosed