⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25421616 | 0.91 | — | — | |
| Tetrafluororesorcinol SCHEMBL123852 | 0.91 | ESR1 (0.30) | — | |
| SCHEMBL69958 | 0.89 | ESR1 (0.32) | — | |
| SCHEMBL5948459 | 0.87 | — | — | |
| Tetrafluororesorcinol SCHEMBL8472089 | 0.87 | — | — | |
| SCHEMBL28140273 | 0.84 | ESR1 (0.31) | — | |
| SCHEMBL8085043 | 0.84 | ESR1 (0.31) | — | |
| SCHEMBL34203 | 0.84 | ESR1 (0.31) | — | |
| SCHEMBL390508 | 0.80 | ESR1 (0.30) | — | |
| SCHEMBL2121680 | 0.80 | ESR1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11840522-B2 | Method of stabilizing perfluoro(2-methylene-4-methyl-1,3-dioxolane) and composition containing stabilized perfluoro(2-methylene-4-methyl-1,3-dioxolane) | TOSOH CORPORATION (JP) | 2023-12-12 | — | — | US | disclosed |
| US-11840522-B2 | Method of stabilizing perfluoro(2-methylene-4-methyl-1,3-dioxolane) and composition containing stabilized perfluoro(2-methylene-4-methyl-1,3-dioxolane) | TOSOH CORPORATION (JP) | 2023-12-12 | — | — | US | disclosed |
| US-20230161252-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-11415887-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-08-16 | — | — | US | disclosed |
| US-20220026805-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-01-27 | — | — | US | disclosed |
| US-20200272048-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-08-27 | — | — | US | disclosed |