SCHEMBL22374205

SCHEMBL22374205

OC(O)C1CCCC(I)C1

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27092120 0.81 TP53 (0.36) TP53
SCHEMBL14236236 0.75
SCHEMBL24522146 0.75
SCHEMBL22434603 0.75
SCHEMBL260160 0.74
SCHEMBL22045043 0.71
SCHEMBL15298848 0.71
SCHEMBL8337584 0.70 IDO1 (0.36) TP53
SCHEMBL8516980 0.70 TP53 (0.30) TP53
SCHEMBL25993336 0.70 IDO1 (0.36) TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11415887-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-08-16 US disclosed
US-20200272048-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-27 US disclosed