SCHEMBL2239388

SCHEMBL2239388

C=C[Si]1(C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2243143 1.00
SCHEMBL1062139 1.00
SCHEMBL78748 1.00
SCHEMBL2240991 1.00
SCHEMBL16001932 1.00
SCHEMBL16001933 1.00
SCHEMBL14841660 1.00
SCHEMBL16859474 1.00
SCHEMBL17107870 1.00
SCHEMBL113199 1.00

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2584005-B1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF TOSOH CORP (JP) 2018-02-21 EP disclosed
US-9793547-B2 Lithium secondary battery and method for producing same TOYOTA JIDOSHA KABUSHIKI KAISHA (JP) 2017-10-17 US disclosed
US-20150188141-A1 LITHIUM SECONDARY BATTERY AND METHOD FOR PRODUCING SAME TOYOTA JIDOSHA KABUSHIKI KAISHA (JP) 2015-07-02 US disclosed
US-8907038-B2 Typical metal containing polysiloxane composition, process for its production, and its uses TOSOH CORPORATION (JP) 2014-12-09 US disclosed
EP-2141188-B1 SILICON-CONTAINING COMPOUND, CURABLE COMPOSITION AND CURED PRODUCT ADEKA CORP (JP) 2014-04-23 EP disclosed
EP-2584005-A1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF Tosoh Corporation (JP) 2013-04-24 EP disclosed
US-20130090447-A1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR ITS PRODUCTION, AND ITS USES TOSOH CORPORATION (JP) 2013-04-11 US disclosed
US-8003736-B2 Silicon-containing compound, curable composition and cured product ADEKA CORPORATION (JP) 2011-08-23 US disclosed
US-20100179283-A1 SILICON-CONTAINING COMPOUND, CURABLE COMPOSITION AND CURED PRODUCT ADEKA CORPORATION (JP) 2010-07-15 US disclosed
EP-2141188-A1 SILICON-CONTAINING COMPOUND, CURABLE COMPOSITION AND CURED PRODUCT Adeka Corporation (JP) 2010-01-06 EP disclosed