SCHEMBL22403148

SCHEMBL22403148

CS(=O)(=O)NC(=O)c1cc(I)c(O)c(I)c1

nearest known ligand 0.45

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ SCN9A Q15858 8/20 0.45
▸ P4HTM Q9NXG6 2/20 0.42
▸ ACLY P53396 1/20 0.39
▸ PTPN1 P18031 1/20 0.39
▸ TTR P02766 1/20 0.38
▸ ESR1 P03372 2/20 0.38
▸ MYC P01106 1/20 0.37
▸ SCN2B O60939 2/20 0.37
▸ SCN1B Q07699 2/20 0.37
▸ SCN5A Q14524 2/20 0.37
▸ SCN1A P35498 1/20 0.37
▸ CYP2C19 P33261 1/20 0.36
▸ EYA3 Q99504 1/20 0.36
▸ PCNA P12004 1/20 0.36
▸ F2 P00734 1/20 0.35
▸ F10 P00742 1/20 0.35
▸ PLG P00747 1/20 0.35
▸ PLAU P00749 1/20 0.35
▸ PLAT P00750 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22097526 0.79 SCN9A (0.48) SCN9AP4HTMACLYPTPN1MYC
SCHEMBL22789926 0.79 SCN5A (0.40) SCN9APTPN1TTRESR1SCN5A
SCHEMBL22097524 0.78 SCN9A (0.47) SCN9AP4HTMPTPN1SCN2BSCN1B
SCHEMBL15695582 0.76 SCN9A (0.47) SCN9AP4HTMPTPN1MYCSCN2B
SCHEMBL25475684 0.75 SCN9A (0.41) SCN9AP4HTMPTPN1MYCSCN2B
SCHEMBL22097497 0.75 P4HTM (0.49) SCN9AP4HTMPTPN1MYCSCN2B
SCHEMBL22097495 0.75 SCN9A (0.44) SCN9AP4HTMACLYPTPN1MYC
SCHEMBL15695613 0.74 SCN9A (0.46) SCN9AP4HTMPTPN1MYCSCN2B
SCHEMBL22097521 0.74 SCN9A (0.54) SCN9AP4HTMPTPN1MYCSCN2B
SCHEMBL16618423 0.74 SCN9A (0.48) SCN9AP4HTMACLYPTPN1MYC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11269253-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-03-08 — — US disclosed
US-20200393760-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-12-17 — — US disclosed
US-20200285149-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-09-10 — — US disclosed
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