Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LPAR3 | Q9UBY5 | 10/20 | 0.50 |
| ▸ | LPAR2 | Q9HBW0 | 8/20 | 0.50 |
| ▸ | LPAR1 | Q92633 | 4/20 | 0.50 |
| ▸ | TSHR | P16473 | 2/20 | 0.45 |
| ▸ | HPGD | P15428 | 1/20 | 0.45 |
| ▸ | P2RY10 | O00398 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28200310 | 1.00 | LPAR3 (0.50) | LPAR3LPAR2LPAR1TSHRHPGD | |
| SCHEMBL27531448 | 1.00 | LPAR3 (0.50) | LPAR3LPAR2LPAR1TSHRHPGD | |
| SCHEMBL27544150 | 1.00 | LPAR3 (0.50) | LPAR3LPAR2LPAR1TSHRHPGD | |
| SCHEMBL28136508 | 1.00 | LPAR3 (0.50) | LPAR3LPAR2LPAR1TSHRHPGD | |
| SCHEMBL31067829 | 1.00 | LPAR3 (0.50) | LPAR3LPAR2LPAR1TSHRHPGD | |
| SCHEMBL30409205 | 1.00 | LPAR3 (0.50) | LPAR3LPAR2LPAR1TSHRHPGD | |
| SCHEMBL30901803 | 1.00 | LPAR3 (0.50) | LPAR3LPAR2LPAR1TSHRHPGD | |
| SCHEMBL30741540 | 1.00 | LPAR3 (0.50) | LPAR3LPAR2LPAR1TSHRHPGD | |
| SCHEMBL29640320 | 1.00 | LPAR3 (0.50) | LPAR3LPAR2LPAR1TSHRHPGD | |
| SCHEMBL28200932 | 1.00 | LPAR3 (0.50) | LPAR3LPAR2LPAR1TSHRHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4682939-A1 | POLISHING COMPOSITION, CONCENTRATED LIQUID OF POLISHING COMPOSITION, AND POLISHING METHOD | Fujimi Incorporated (JP) | 2026-01-21 | — | — | EP | disclosed |
| WO-2025069725-A1 | POLISHING COMPOSITION, CONCENTRATED SOLUTION OF POLISHING COMPOSITION, AND POLISHING METHOD | 株式会社フジミインコーポレーテッド | 2025-04-03 | — | — | WO | disclosed |
| WO-2023079620-A1 | INKJET INK FOR FORMING PARTITION, INKJET INK SET FOR FORMING PARTITION, METHOD FOR MANUFACTURING LED DEVICE, AND LED DEVICE | コニカミノルタ株式会社 | 2023-05-11 | — | — | WO | disclosed |
| WO-2023079622-A1 | INKJET INK FOR PARTITION WALL FORMATION, INKJET INK SET FOR PARTITION WALL FORMATION, AND LED DEVICE MANUFACTURING METHOD | コニカミノルタ株式会社 | 2023-05-11 | — | — | WO | disclosed |
| CN-115703207-A | Surface treatment method, method for manufacturing semiconductor substrate, surface treatment composition, and system for manufacturing semiconductor substrate | 福吉米株式会社 | 2023-02-17 | — | — | CN | disclosed |
| WO-2020194978-A1 | SURFACE TREATMENT COMPOSITION, METHOD FOR MANUFACTURING SAME, SURFACE TREATMENT METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | 株式会社フジミインコーポレーテッド | 2020-10-01 | — | — | WO | disclosed |