SCHEMBL224863

SCHEMBL224863

O/C=C/O/C=C/O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL224864 1.00
SCHEMBL6861805 0.95
SCHEMBL17354416 0.80
SCHEMBL8751532 0.80
SCHEMBL1401834 0.74
SCHEMBL6123442 0.71
SCHEMBL12596414 0.70
SCHEMBL13685638 0.70
SCHEMBL10363321 0.67
SCHEMBL2205115 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 141 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11613617-B2 Multilayer film TOYOBO CO., LTD. (JP) 2023-03-28 US disclosed
US-11344927-B2 Cleaner TOMOEGAWA CO., LTD. (JP) 2022-05-31 US disclosed
EP-2647500-B1 MULTILAYER FILM TOYO BOSEKI (JP) 2021-07-07 EP disclosed
CN-108698372-B Laminated film 东洋纺株式会社 2020-07-07 CN disclosed
US-20190247895-A1 CLEANER TOMOEGAWA CORPORATION (JP) 2019-08-15 US disclosed
US-10001704-B2 Photosensitive resin composition, method of manufacturing conductive pattern, substrate, element, and touch panel TORAY INDUSTRIES, INC. (JP) 2018-06-19 US disclosed
EP-1908582-B1 GAS BARRIER LAMINATE FOR USE IN HOT WATER TREATMENT MITSUBISHI CHEM CORP (JP) 2018-06-13 EP disclosed
US-20180126696-A1 GAS BARRIER LAMINATE MITSUI CHEMICALS TOHCELLO, INC. (JP) 2018-05-10 US disclosed
EP-3299166-A1 GAS BARRIER LAMINATE Mitsui Chemicals Tohcello, Inc. (JP) 2018-03-28 EP disclosed
US-9798242-B2 Rinse solution for pattern formation and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-10-24 US disclosed
US-4435536-A CURABLE VINYL TYPE POLYMER HAVING SILYL GROUPS KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1984-03-06 US disclosed
US-4399261-A Curable composition KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1983-08-16 US disclosed
US-4371664-A PAINTS, CURING CATALYST KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1983-02-01 US disclosed
US-4368297-A MALEIC ANHYDRIDE COMPONENT KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1983-01-11 US disclosed
EP-0063817-A1 Metallic base paint KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1982-11-03 EP disclosed
EP-0063753-A2 One-pack composition comprising a silyl group containing vinyl type polymer KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1982-11-03 EP disclosed
EP-0054923-A1 Curable resin composition and its use for preparing coatings KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1982-06-30 EP disclosed
EP-0048461-A2 Vinyl resin composition containing silyl groups and a paint comprising said composition KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1982-03-31 EP disclosed
EP-0044049-A1 A method of producing a silyl group-containing venyl resin and a paint containing the resin KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1982-01-20 EP disclosed
US-4220709-A Heat developable imaging materials and process EASTMAN KODAK COMPANY (US) 1980-09-02 US disclosed