SCHEMBL22493533

SCHEMBL22493533

C=CCCCCCC(C)Br

nearest known ligand 0.48

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.48
ALDH1A1 P00352 4/20 0.40
USP2 O75604 4/20 0.39
MAPT P10636 3/20 0.39
CYP3A4 P08684 2/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
HPGD P15428 1/20 0.39
ABCC4 O15439 1/20 0.37
LMNA P02545 2/20 0.36
TRPA1 O75762 2/20 0.34
RECQL P46063 1/20 0.33
LPAR3 Q9UBY5 2/20 0.32
LPAR2 Q9HBW0 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22493532 1.00 TSHR (0.48) TSHRALDH1A1USP2MAPTCYP3A4
SCHEMBL5575846 1.00 TSHR (0.48) TSHRALDH1A1USP2MAPTCYP3A4
SCHEMBL19639475 1.00 TSHR (0.48) TSHRALDH1A1USP2MAPTCYP3A4
SCHEMBL14743385 1.00 TSHR (0.48) TSHRALDH1A1USP2MAPTCYP3A4
SCHEMBL22493527 1.00 TSHR (0.48) TSHRALDH1A1USP2MAPTCYP3A4
SCHEMBL8425055 1.00 TSHR (0.48) TSHRALDH1A1USP2MAPTCYP3A4
SCHEMBL8834848 1.00 TSHR (0.48) TSHRALDH1A1USP2MAPTCYP3A4
SCHEMBL313009 0.98
SCHEMBL22493549 0.90
SCHEMBL30319221 0.87 TSHR (0.41) TSHRALDH1A1USP2MAPTCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11111348-B2 Method for treating surface of resin material layer and resin material MITSUBISHI HEAVY INDUSTRIES, LTD. (JP) 2021-09-07 US disclosed
EP-3450488-B1 METHOD FOR TREATING SURFACE OF RESIN MATERIAL LAYER AND RESIN MATERIAL MITSUBISHI HEAVY IND LTD (JP) 2021-03-24 EP disclosed
US-20200317876-A1 METHOD FOR TREATING SURFACE OF RESIN MATERIAL LAYER AND RESIN MATERIAL MITSUBISHI HEAVY INDUSTRIES, LTD. (JP) 2020-10-08 US disclosed
US-20160291477-A1 SURFACE TREATMENT PROCESS AND SURFACE TREATMENT LIQUID TOKYO OHKA KOGYO CO., LTD. (JP) 2016-10-06 US disclosed