Acetic Acid

Acetic Acid

SCHEMBL22497635

CC(=O)O.CCn1c2ccc(C(=O)c3ccccc3C)cc2c2cc(C(C)=NO)ccc21

nearest known ligand 0.65

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 7/20 0.65
LMNA P02545 4/20 0.65
MAPT P10636 4/20 0.65
HPGD P15428 6/20 0.64
HTT P42858 4/20 0.64
GFER P55789 2/20 0.52
ALDH1A1 P00352 5/20 0.46
MEN1 O00255 4/20 0.46
KMT2A Q03164 4/20 0.46
SMN1; SMN2 Q16637 2/20 0.46
CNR2 P34972 1/20 0.42
POLB P06746 2/20 0.41
MAPK1 P28482 1/20 0.41
BLM P54132 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
NPSR1 Q6W5P4 1/20 0.40
TSHR P16473 1/20 0.40
HSD17B10 Q99714 1/20 0.40
PTGER4 P35408 1/20 0.39
TUBB4A P04350 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL29457255 1.00 KDM4E (0.65) KDM4ELMNAMAPTHPGDHTT
Acetic Acid SCHEMBL23929055 1.00 KDM4E (0.65) KDM4ELMNAMAPTHPGDHTT
SCHEMBL22460842 0.98 KDM4E (0.67) KDM4ELMNAMAPTHPGDHTT
SCHEMBL3803392 0.98 KDM4E (0.67) KDM4ELMNAMAPTHPGDHTT
SCHEMBL29616531 0.98 KDM4E (0.67) KDM4ELMNAMAPTHPGDHTT
SCHEMBL29895750 0.98 KDM4E (0.67) KDM4ELMNAMAPTHPGDHTT
Acetic Acid SCHEMBL22497408 0.89 KDM4E (0.50) KDM4ELMNAMAPTHPGDHTT
Acetic Acid SCHEMBL22497407 0.89 KDM4E (0.50) KDM4ELMNAMAPTHPGDHTT
Acetic Acid SCHEMBL29582261 0.89 KDM4E (0.50) KDM4ELMNAMAPTHPGDHTT
SCHEMBL31595917 0.89 KDM4E (0.53) KDM4ELMNAMAPTHPGDHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114326299-A Photosensitive resin composition, optical filter and application 常州强力电子新材料股份有限公司 2022-04-12 CN claimed
CN-111752100-A Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN claimed
CN-111258180-B Hexaarylbisimidazoles mixed photoinitiator and application thereof 常州正洁智造科技有限公司 2024-03-08 CN disclosed
CN-116410135-A Naphthalene vinyl pyridine compound, photosensitive resin composition, application thereof and patterning method 常州强力先端电子材料有限公司 2023-07-11 CN disclosed
CN-112062721-B HABI photoinitiator capable of improving system stability and application thereof 常州正洁智造科技有限公司 2023-06-30 CN disclosed
CN-113527207-B Ethoxy/propoxy modified pyrazoline organic matter, application thereof, photo-curing composition and photoresist 常州强力电子新材料股份有限公司 2023-06-06 CN disclosed
CN-111752096-B Photosensitive resin composition for color filter and color filter 常州正洁智造科技有限公司 2022-10-14 CN disclosed
CN-115128899-A Photosensitive resin composition with improved system hue stability 常州正洁智造科技有限公司 2022-09-30 CN disclosed
CN-111752091-B Application of HABI mixed photoinitiator in UVLED photocuring 常州正洁智造科技有限公司 2022-09-06 CN disclosed
CN-112835261-B EO/PO modified 9-phenylacridine photosensitizer and application thereof 常州强力电子新材料股份有限公司 2022-06-07 CN disclosed
CN-114326309-A Photosensitive resin composition and application thereof 常州正洁智造科技有限公司 2022-04-12 CN disclosed
CN-111752091-A Application of HABI mixed photoinitiator in UVLED photocuring 常州格林感光新材料有限公司 2020-10-09 CN disclosed
CN-111747897-A Hexaarylbisimidazole photoinitiator and application thereof 常州格林感光新材料有限公司 2020-10-09 CN disclosed
CN-111752100-A Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN disclosed
CN-111752096-A Photosensitive resin composition for color filter and color filter 常州格林感光新材料有限公司 2020-10-09 CN disclosed
CN-111752097-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN disclosed
CN-111752098-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN disclosed
WO-2020200020-A1 HEXAARYLBIIMIDAZOLE PHOTOINITIATOR AND APPLICATION THEREOF 常州格林感光新材料有限公司 2020-10-08 WO disclosed
CN-111258180-A Hexaarylbisimidazole mixed photoinitiator and application thereof 常州格林感光新材料有限公司 2020-06-09 CN disclosed
CN-111258181-A Hexaarylbisimidazole mixed photoinitiator 常州格林感光新材料有限公司 2020-06-09 CN disclosed