SCHEMBL22503151

SCHEMBL22503151

CCCCCCCC/C=C\CCCCCCCCCCCC(=O)NS(=O)(=O)C(F)(F)F

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 3/20 0.58
FAAH O00519 5/20 0.56
CES1 P23141 2/20 0.56
HRH3 Q9Y5N1 1/20 0.55
TERT O14746 3/20 0.50
KMT2A Q03164 3/20 0.50
CYP1A2 P05177 2/20 0.50
MAPT P10636 2/20 0.50
CYP2C19 P33261 2/20 0.50
BLM P54132 2/20 0.50
HSD17B10 Q99714 2/20 0.50
FABP4 P15090 2/20 0.50
MEN1 O00255 2/20 0.50
PTPN1 P18031 2/20 0.50
PPARG P37231 2/20 0.50
PPARD Q03181 2/20 0.50
PPARA Q07869 2/20 0.50
GMNN O75496 1/20 0.50
USP2 O75604 1/20 0.50
LMNA P02545 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22503112 1.00 EPHX2 (0.58) EPHX2FAAHCES1HRH3TERT
SCHEMBL22503150 1.00 EPHX2 (0.58) EPHX2FAAHCES1HRH3TERT
SCHEMBL22503117 0.96 MEN1 (0.57) EPHX2KMT2AMAPTBLMHSD17B10
SCHEMBL22503125 0.91 EPHX1 (0.53) EPHX2FAAHCES1KMT2ACYP1A2
SCHEMBL22503148 0.91 EPHX1 (0.53) EPHX2FAAHCES1KMT2ACYP1A2
SCHEMBL22503243 0.91 EPHX1 (0.53) EPHX2FAAHCES1KMT2ACYP1A2
SCHEMBL22503075 0.91 EPHX1 (0.53) EPHX2FAAHCES1KMT2ACYP1A2
SCHEMBL22503217 0.91 EPHX1 (0.53) EPHX2FAAHCES1KMT2ACYP1A2
SCHEMBL22503126 0.91 EPHX1 (0.53) EPHX2FAAHCES1KMT2ACYP1A2
SCHEMBL22503213 0.91 EPHX1 (0.53) EPHX2FAAHCES1KMT2ACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 US disclosed