⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22582081 | 1.00 | — | — | |
| SCHEMBL22582062 | 0.98 | — | — | |
| SCHEMBL22582109 | 0.95 | — | — | |
| SCHEMBL22582084 | 0.89 | — | — | |
| SCHEMBL22582091 | 0.81 | — | — | |
| SCHEMBL650479 | 0.76 | — | — | |
| SCHEMBL8393118 | 0.75 | — | — | |
| SCHEMBL28377191 | 0.75 | — | — | |
| SCHEMBL650290 | 0.74 | — | — | |
| SCHEMBL8755976 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240287103-A1 | WATER-REPELLENT PROTECTIVE FILM-FORMING AGENT, WATER-REPELLENT PROTECTIVE FILM-FORMING CHEMICAL SOLUTION, AND WAFER SURFACE TREATMENT METHOD | CENTRAL GLASS CO LTD (JP) | 2024-08-29 | — | — | US | disclosed |
| CN-111699546-B | Water-repellent protective film forming agent and chemical solution for forming water-repellent protective film | 中央硝子株式会社 | 2023-09-12 | — | — | CN | disclosed |
| US-20200339611-A1 | WATER-REPELLENT PROTECTIVE FILM-FORMING AGENT, WATER-REPELLENT PROTECTIVE FILM-FORMING CHEMICAL SOLUTION, AND WAFER SURFACE TREATMENT METHOD | CENTRAL GLASS COMPANY, LIMITED (JP) | 2020-10-29 | — | — | US | disclosed |
| CN-111699546-A | Water-repellent protective film forming agent, chemical solution for forming water-repellent protective film, and method for surface treatment of wafer | 中央硝子株式会社 | 2020-09-22 | — | — | CN | disclosed |