⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4995399 | 0.86 | MEN1 (0.32) | — | |
| SCHEMBL222555 | 0.80 | MEN1 (0.41) | — | |
| SCHEMBL21184090 | 0.79 | — | — | |
| SCHEMBL25233759 | 0.78 | MEN1 (0.41) | — | |
| SCHEMBL15373732 | 0.75 | MEN1 (0.41) | — | |
| SCHEMBL22958273 | 0.74 | — | — | |
| SCHEMBL20860322 | 0.74 | — | — | |
| SCHEMBL23839182 | 0.74 | — | — | |
| SCHEMBL20860351 | 0.74 | — | — | |
| SCHEMBL24521730 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 271 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5280039-A | Bicyclic carbamates and methods of treating inflammatory diseases using the same | PFIZER INC. (US) | 1994-01-18 | — | — | US | claimed |
| US-11803122-B2 | Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| WO-2023162551-A1 | METHOD FOR PRODUCING PLATED SHAPED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023162552-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD FOR SUBSTRATE WITH TEMPLATE, AND PRODUCTION METHOD FOR PLATED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| US-20230273521-A1 | CHEMICALLY AMPLIFIED PHOTOSENTIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-08-31 | — | — | US | disclosed |
| US-20230229084-A1 | CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-20 | — | — | US | disclosed |
| CN-116157739-A | Chemically amplified photosensitive composition, photosensitive dry film, method for producing substrate with plating mold, and method for producing plating molded article | 东京应化工业株式会社 | 2023-05-23 | — | — | CN | disclosed |
| US-20230106185-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, AND ACID DIFFUSION SUPPRESSING AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-04-06 | — | — | US | disclosed |
| CN-115917432-A | Photosensitive composition, photosensitive dry film, method for producing substrate with mold for plating, and method for producing plated article | 东京应化工业株式会社 | 2023-04-04 | — | — | CN | disclosed |
| US-20230102353-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING PATTERNED RESIST FILM, METHOD FOR PRODUCING SUBSTRATE PROVIDED WITH TEMPLATE, AND METHOD FOR PRODUCING A PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-03-30 | — | — | US | disclosed |
| CN-1908772-A | LCD device | FUJI PHOTO FILM CO LTD (JP) | 2007-02-07 | — | — | CN | disclosed |
| US-7087753-B2 | Naphthyltriazines as stabilizers for organic material | CIBA SPECIALTY CHEMICALS CORP. (US) | 2006-08-08 | — | — | US | disclosed |
| US-20060141383-A1 | Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions | JSR CORPORATION (JP) | 2006-06-29 | — | — | US | disclosed |
| EP-1586570-A1 | SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |
| US-20050169859-A1 | Naphthyltriazines as stabilizers for organic material | TOAN VIEN V (CH) | 2005-08-04 | — | — | US | disclosed |
| US-20050038245-A1 | Naphthyltriazines as stabilizers for organic material | CIBA SPECIALTY CHEMICALS CORP. | 2005-02-17 | — | — | US | disclosed |
| CN-1571814-A | Naphthyltriazines as stabilizers for organic materials | CIBA SC HOLDING AG (CH) | 2005-01-26 | — | — | CN | disclosed |
| EP-1463774-A1 | NAPHTHYLTRIAZINES AS STABILIZERS FOR ORGANIC MATERIAL | Ciba SC Holding AG (CH) | 2004-10-06 | — | — | EP | disclosed |
| WO-2003035734-A1 | NAPHTHYLTRIAZINES AS STABILIZERS FOR ORGANIC MATERIAL | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2003-05-01 | — | — | WO | disclosed |
| US-5434150-A | Anticoagulants, cardiovascular disorders | DR. KARL THOMAE GMBH (DE) | 1995-07-18 | — | — | US | disclosed |