Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC4 | P56524 | 2/20 | 0.37 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.37 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.37 |
| ▸ | HDAC6 | Q9UBN7 | 2/20 | 0.37 |
| ▸ | GSTP1 | P09211 | 1/20 | 0.31 |
| ▸ | CTSK | P43235 | 1/20 | 0.31 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.31 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.31 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.31 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22639092 | 1.00 | HDAC4 (0.37) | HDAC4HDAC2HDAC8HDAC6GSTP1 | |
| SCHEMBL22639094 | 0.98 | HDAC4 (0.38) | HDAC4HDAC2HDAC8HDAC6GSTP1 | |
| SCHEMBL22639081 | 0.92 | — | — | |
| SCHEMBL2185733 | 0.83 | HDAC4 (0.39) | HDAC4HDAC2HDAC8HDAC6GSTP1 | |
| SCHEMBL20440728 | 0.83 | HDAC4 (0.39) | HDAC4HDAC2HDAC8HDAC6GSTP1 | |
| SCHEMBL10801637 | 0.82 | HDAC4 (0.38) | HDAC4HDAC2HDAC8HDAC6GSTP1 | |
| SCHEMBL29174091 | 0.82 | HDAC4 (0.38) | HDAC4HDAC2HDAC8HDAC6GSTP1 | |
| SCHEMBL20440725 | 0.81 | HDAC4 (0.41) | HDAC4HDAC2HDAC8HDAC6GSTP1 | |
| SCHEMBL166015 | 0.81 | HDAC4 (0.41) | HDAC4HDAC2HDAC8HDAC6GSTP1 | |
| SCHEMBL22639098 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020226150-A1 | COMPOUND AND PRODUCTION METHOD THEREOF, RESIN, COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, UNDERLAYER FILM FOR LITHOGRAPHY, OPTICAL COMPONENT, AND METHOD FOR PURIFYING COMPOUND OR RESIN | 学校法人 関西大学 | 2020-11-12 | — | — | WO | disclosed |