SCHEMBL22639100

SCHEMBL22639100

[CH2]C(=O)C1=CCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22639078 0.81
SCHEMBL22639095 0.79
SCHEMBL22639105 0.78 HDAC2 (0.55)
SCHEMBL22639104 0.78 HDAC2 (0.55)
SCHEMBL6964110 0.75
SCHEMBL22639096 0.75
SCHEMBL2597101 0.75 HDAC4 (0.37)
SCHEMBL22290 0.73
SCHEMBL1259101 0.71
SCHEMBL11674811 0.71 TSHR (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020226150-A1 COMPOUND AND PRODUCTION METHOD THEREOF, RESIN, COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, UNDERLAYER FILM FOR LITHOGRAPHY, OPTICAL COMPONENT, AND METHOD FOR PURIFYING COMPOUND OR RESIN 学校法人 関西大学 2020-11-12 WO disclosed