SCHEMBL2264265

SCHEMBL2264265

CCCCCC(C)OCCOCCOCCO

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.57
KMT2A Q03164 3/20 0.57
THRB P10828 1/20 0.57
HTT P42858 1/20 0.57
MAPT P10636 1/20 0.57
TSHR P16473 2/20 0.52
MAPK1 P28482 2/20 0.40
ALDH1A1 P00352 2/20 0.40
LMNA P02545 2/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
USP2 O75604 2/20 0.40
CYP3A4 P08684 1/20 0.40
CASP1 P29466 1/20 0.40
SLCO1B3 Q9NPD5 1/20 0.40
SLCO1B1 Q9Y6L6 1/20 0.40
FAAH O00519 5/20 0.36
CNR1 P21554 1/20 0.35
CNR2 P34972 1/20 0.35
EPHX2 P34913 1/20 0.34
OPRM1 P35372 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29521238 1.00 MEN1 (0.57) MEN1KMT2ATHRBHTTMAPT
SCHEMBL29908275 1.00 MEN1 (0.57) MEN1KMT2ATHRBHTTMAPT
SCHEMBL2266299 1.00 MEN1 (0.57) MEN1KMT2ATHRBHTTMAPT
SCHEMBL2263661 1.00 MEN1 (0.57) MEN1KMT2ATHRBHTTMAPT
SCHEMBL4592663 0.98 MEN1 (0.60) MEN1KMT2ATHRBHTTMAPT
SCHEMBL11659395 0.98 MEN1 (0.60) MEN1KMT2ATHRBHTTMAPT
SCHEMBL4585539 0.98 MEN1 (0.60) MEN1KMT2ATHRBHTTMAPT
SCHEMBL5316580 0.98 MEN1 (0.60) MEN1KMT2ATHRBHTTMAPT
SCHEMBL11060042 0.98 MEN1 (0.60) MEN1KMT2ATHRBHTTMAPT
SCHEMBL14169158 0.98 MEN1 (0.60) MEN1KMT2ATHRBHTTMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113169248-B Method for manufacturing semiconductor element and method for manufacturing solar cell 东丽株式会社 2024-10-01 CN disclosed
WO-2022208663-A1 WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE, AND CURABLE COMPOSITION 昭和電工マテリアルズ株式会社 2022-10-06 WO disclosed
US-20220187517-A1 WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE, AND WAVELENGTH CONVERSION RESIN COMPOSITION SHOWA DENKO MATERIALS CO., LTD. (JP) 2022-06-16 US disclosed
CN-113557610-A Wavelength conversion member, backlight unit, image display device, and resin composition for wavelength conversion 昭和电工材料株式会社 2021-10-26 CN disclosed
US-20210292643-A1 WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, RESIN COMPOSITION FOR WAVELENGTH CONVERSION, AND RESIN CURED PRODUCT FOR WAVELENGTH CONVERSION SHOWA DENKO MATERIALS CO LTD (JP) 2021-09-23 US disclosed
US-11061278-B2 Wavelength conversion member, back light unit, image display device, resin composition for wavelength conversion, and resin cured product for wavelength conversion SHOWA DENKO MATERIALS CO., LTD. (JP) 2021-07-13 US disclosed
US-20210139768-A1 WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, AND CURABLE COMPOSITION HITACHI CHEMICAL COMPANY, LTD. (JP) 2021-05-13 US disclosed
US-20210139769-A1 WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, CURABLE COMPOSITION AND CURED PRODUCT HITACHI CHEMICAL COMPANY, LTD. (JP) 2021-05-13 US disclosed
WO-2021084603-A1 RESIN COMPOSITION FOR WAVELENGTH CONVERSION, CURED RESIN MATERIAL FOR WAVELENGTH CONVERSION, WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT AND IMAGE DISPLAY DEVICE 昭和電工マテリアルズ株式会社 2021-05-06 WO disclosed
US-20210040383-A1 WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE AND CURABLE COMPOSITION HITACHI CHEMICAL COMPANY, LTD. (JP) 2021-02-11 US disclosed
US-8034545-B2 Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide HITACHI CHEMICAL CO., LTD. (JP) 2011-10-11 US disclosed
US-20110212564-A1 METHOD FOR PRODUCING PHOTOVOLTAIC CELL HITACHI CHEMICAL COMPANY, LTD. 2011-09-01 US disclosed
US-20110195540-A1 COMPOSITION FOR FORMING P-TYPE DIFFUSION LAYER, METHOD FOR FORMING P-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL HITACHI CHEMICAL COMPANY, LTD. 2011-08-11 US disclosed
EP-2355137-A1 Composition for forming p-type diffusion layer, method for forming p-type diffusion layer, and method for producing photovoltaic cell Hitachi Chemical Co., Ltd. (JP) 2011-08-10 EP disclosed
US-20090220897-A1 RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE HITACHI CHEMICAL CO., LTD. (JP) 2009-09-03 US disclosed
US-7297464-B2 Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide HITACHI CHEMICAL CO., LTD. (JP) 2007-11-20 US disclosed
EP-1672427-A1 RADIATION-CURING COMPOSITION, METHOD FOR STORING SAME, METHOD FOR FORMING CURED FILM, METHOD FOR FORMING PATTERN, METHOD FOR USING PATTERN, ELECTRONIC COMPONENT, AND OPTICAL WAVEGUIDE Hitachi Chemical Co., Ltd. (JP) 2006-06-21 EP disclosed
EP-1672426-A1 RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE HITACHI CHEMICAL COMPANY, LTD. (JP) 2006-06-21 EP disclosed
US-20050266344-A1 Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide HITACHI CHEMICAL CO., LTD. (JP) 2005-12-01 US disclosed
US-20050239953-A1 Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide HITACHI CHEMICAL CO., LTD. (JP) 2005-10-27 US disclosed