Propionic Acid

Propionic Acid

SCHEMBL2269094

CCC(=O)O.COCC(C)O

nearest known ligand 0.48

Full drug profile on Sugi Atlas →

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
FFAR3 O14843 2/20 0.48
HSD17B10 Q99714 1/20 0.44
MAPT P10636 1/20 0.38
TDP1 Q9NUW8 2/20 0.38
ALDH1A1 P00352 2/20 0.37
MAPK1 P28482 1/20 0.36
TSHR P16473 1/20 0.35
LMNA P02545 1/20 0.34
TP53 P04637 1/20 0.33
KDM4E B2RXH2 1/20 0.31
SLC22A6 Q4U2R8 1/20 0.31
HDAC3 O15379 1/20 0.31
HDAC1 Q13547 1/20 0.31
HDAC2 Q92769 1/20 0.31
HDAC8 Q9BY41 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bicarbonate SCHEMBL28079320 0.87 HSD17B10 (0.44) HSD17B10MAPTTDP1ALDH1A1MAPK1
SCHEMBL14603665 0.86 TDP1 (0.48) HSD17B10MAPTTDP1MAPK1TSHR
Butanone SCHEMBL9449827 0.86 TDP1 (0.48) HSD17B10MAPTTDP1ALDH1A1MAPK1
Acetic Acid SCHEMBL113972 0.85 MAPK1 (0.44) FFAR3HSD17B10MAPTTDP1ALDH1A1
Acetic Acid SCHEMBL3255637 0.85 MAPK1 (0.44) FFAR3HSD17B10MAPTTDP1ALDH1A1
Acetic Acid SCHEMBL2772542 0.85 MAPK1 (0.44) FFAR3HSD17B10MAPTTDP1ALDH1A1
Acetic Acid SCHEMBL3249560 0.85 MAPK1 (0.44) FFAR3HSD17B10MAPTTDP1ALDH1A1
Butyric Acid SCHEMBL27625324 0.85 FFAR3 (0.54) FFAR3HSD17B10MAPTTDP1ALDH1A1
Butanone SCHEMBL27721576 0.84 TDP1 (0.46) HSD17B10MAPTTDP1ALDH1A1MAPK1
Butanone SCHEMBL6687114 0.84 TDP1 (0.46) HSD17B10MAPTTDP1ALDH1A1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110527498-A A kind of method that combustible ice is quickly subcooled nanometer liquefier and its exploits combustible ice CHENGDU NENGSHENG MATERIAL TECH DEVELOPMENT CO LTD 2019-12-03 CN claimed
CN-106317854-A Single-component polyurethane foam joint mixture and preparing method thereof 广东三和化工科技有限公司 2017-01-11 CN claimed
US-8003588-B2 Composition and method using same to remove urethane products from a substrate Tepolt, Danny P. (US) 2011-08-23 US claimed
US-20090264331-A1 COMPOSITION AND METHOD USING SAME TO REMOVE URETHANE PRODUCTS FROM A SUBSTRATE Tepolt, Danny P. (US) 2009-10-22 US claimed
US-20060186379-A1 Composition and method using same to remove urethane products from a substrate TEPOLT, DANNY P. 2006-08-24 US claimed
CN-115516342-A Anti-glare/anti-reflection member, polarizing plate, front sheet, and image display device provided with same, and screening method for anti-glare/anti-reflection member 大日本印刷株式会社 2022-12-23 CN disclosed
CN-110527498-A A kind of method that combustible ice is quickly subcooled nanometer liquefier and its exploits combustible ice CHENGDU NENGSHENG MATERIAL TECH DEVELOPMENT CO LTD 2019-12-03 CN disclosed
CN-104752171-B gap filling material and method 台湾积体电路制造股份有限公司 2018-02-27 CN disclosed
CN-207044817-U A kind of composite membrane 张家港康得新光电材料有限公司 2018-02-27 CN disclosed
CN-107201083-A A kind of ink-jet anti slip glass ink and preparation method thereof 山东国瓷康立泰新材料科技有限公司 2017-09-26 CN disclosed
CN-107031154-A A kind of composite membrane 张家港康得新光电材料有限公司 2017-08-11 CN disclosed
CN-106317854-A Single-component polyurethane foam joint mixture and preparing method thereof 广东三和化工科技有限公司 2017-01-11 CN disclosed
CN-102492359-A Oil-based polyurethane transparent primer for decoration and preparation method thereof DONGGUAN TAIHO CHEM IND PROD 2012-06-13 CN disclosed
US-8003588-B2 Composition and method using same to remove urethane products from a substrate Tepolt, Danny P. (US) 2011-08-23 US disclosed
US-7713677-B2 Photoresist composition, method of patterning thin film using the same, and method of manufacturing liquid crystal display panel using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-05-11 US disclosed
US-20090264331-A1 COMPOSITION AND METHOD USING SAME TO REMOVE URETHANE PRODUCTS FROM A SUBSTRATE Tepolt, Danny P. (US) 2009-10-22 US disclosed
US-7531049-B2 Composition and method using same to remove urethane products from a substrate Tepolt, Danny P. (US) 2009-05-12 US disclosed
CN-101236356-A Photoresist composition, thin film patterning method using the same, and method of fabricating liquid crystal display using the same SAMSUNG ELECTRONICS CO LTD (KR) 2008-08-06 CN disclosed
US-20070190454-A1 PHOTORESIST COMPOSITION, METHOD OF PATTERNING THIN FILM USING THE SAME, AND METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY PANEL USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-08-16 US disclosed
US-20060186379-A1 Composition and method using same to remove urethane products from a substrate TEPOLT, DANNY P. 2006-08-24 US disclosed