⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15360618 | 0.80 | — | — | |
| SCHEMBL2268576 | 0.75 | — | — | |
| SCHEMBL15361262 | 0.74 | — | — | |
| SCHEMBL2100478 | 0.67 | — | — | |
| SCHEMBL2102923 | 0.67 | — | — | |
| SCHEMBL2267522 | 0.65 | TSHR (0.30) | — | |
| SCHEMBL2273048 | 0.64 | — | — | |
| SCHEMBL24436900 | 0.63 | CHRM2 (0.31) | — | |
| SCHEMBL2102463 | 0.62 | — | — | |
| SCHEMBL2101304 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024228843-A1 | PLASMA PRETREATMENT FOR SELECTIVE ADSORPTION OF AMINOSILANE INHIBITOR | LAM RESEARCH CORPORATION (US) | 2024-11-07 | — | — | WO | claimed |
| US-11670512-B2 | Selective deposition on silicon containing surfaces | VERSUM MATERIALS US, LLC (US) | 2023-06-06 | — | — | US | claimed |
| US-20230048767-A1 | Surface Treatment Compositions and Methods | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2023-02-16 | — | — | US | claimed |
| US-11508569-B2 | Surface treatment compositions and methods | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2022-11-22 | — | — | US | claimed |
| EP-4017924-A1 | SURFACE TREATMENT COMPOSITIONS AND METHODS | FUJIFILM Electronic Materials U.S.A., Inc. (US) | 2022-06-29 | — | — | EP | claimed |
| CN-110612364-B | Selective deposition on silicon-containing surfaces | 弗萨姆材料美国有限责任公司 | 2022-04-05 | — | — | CN | claimed |
| CN-114258420-A | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2022-03-29 | — | — | CN | claimed |
| US-20210118684-A1 | SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES | VERSUM MATERIALS US, LLC | 2021-04-22 | — | — | US | claimed |
| WO-2021034491-A1 | SURFACE TREATMENT COMPOSITIONS AND METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2021-02-25 | — | — | WO | claimed |
| US-20210057210-A1 | Surface Treatment Compositions and Methods | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2021-02-25 | — | — | US | claimed |
| CN-110612364-A | Selective deposition on silicon-containing surfaces | 弗萨姆材料美国有限责任公司 | 2019-12-24 | — | — | CN | claimed |
| WO-2018170382-A1 | SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES | VERSUM MATERIALS US, LLC (US) | 2018-09-20 | — | — | WO | claimed |
| WO-2025072211-A1 | PRETREATING SUBSTRATE FOR SELECTIVE DEPOSITION | LAM RESEARCH CORPORATION (US) | 2025-04-03 | — | — | WO | disclosed |
| WO-2024228843-A1 | PLASMA PRETREATMENT FOR SELECTIVE ADSORPTION OF AMINOSILANE INHIBITOR | LAM RESEARCH CORPORATION (US) | 2024-11-07 | — | — | WO | disclosed |
| WO-2024163215-A2 | SURFACE TREATMENT COMPOSITIONS AND METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2024-08-08 | — | — | WO | disclosed |
| US-20240254415-A1 | Surface Treatment Compositions and Methods | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2024-08-01 | — | — | US | disclosed |
| US-8785639-B2 | Substituted dihydropyrazolo[3,4-D]pyrrolo[2,3-B]pyridines and methods of use thereof | ABBVIE INC. (US) | 2014-07-22 | — | — | US | disclosed |
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20110190489-A1 | Novel Tricyclic Compounds | ABBOTT LABORATORIES (US) | 2011-08-04 | — | — | US | disclosed |