SCHEMBL2270446

SCHEMBL2270446

CN(C)C=C[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8695062 0.75
SCHEMBL413517 0.71
SCHEMBL15372069 0.71
SCHEMBL185083 0.71
Hydrochloric Acid SCHEMBL21245480 0.64 TSHR (0.36)
SCHEMBL6023515 0.64 POLB (0.36)
SCHEMBL6023517 0.64 POLB (0.36)
Trimethylammonium SCHEMBL27490794 0.61
SCHEMBL283892 0.61
SCHEMBL283893 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115746368-B Atomic oxygen resistant/ultraviolet blocking modified film layer on polymer surface as well as preparation method and application thereof 中国科学院上海硅酸盐研究所 2023-10-13 CN disclosed
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed