⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL27785262 | 0.96 | — | — | |
| SCHEMBL16582977 | 0.70 | — | — | |
| SCHEMBL16582992 | 0.70 | — | — | |
| SCHEMBL3976256 | 0.69 | — | — | |
| SCHEMBL10709348 | 0.69 | — | — | |
| SCHEMBL2272336 | 0.69 | — | — | |
| SCHEMBL27966736 | 0.65 | — | — | |
| SCHEMBL2267889 | 0.65 | — | — | |
| SCHEMBL2268201 | 0.64 | — | — | |
| SCHEMBL16582966 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111886676-B | Method for treating surface of wafer and composition therefor | 中央硝子株式会社 | 2024-09-27 | — | — | CN | claimed |
| US-11603485-B2 | Surface treatment method of wafer and composition used for said method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-03-14 | — | — | US | claimed |
| CN-109075021-A | Improved self-assembled monolayer barrier with intermittent air-water exposure | 应用材料公司 | 2018-12-21 | — | — | CN | claimed |
| CN-103374708-B | High temperature atomic layer deposition of silicon oxide thin films | 气体产品与化学公司 | 2017-05-17 | — | — | CN | claimed |
| CN-103374708-A | High temperature atomic layer deposition of silicon oxide thin films | AIR PROD & CHEM | 2013-10-30 | — | — | CN | claimed |
| WO-2009058735-A1 | SURFACE COATING PROCESS | INTEGRATED SURFACE TECHNOLOGIES, INC. (US) | 2009-05-07 | — | — | WO | claimed |
| US-6156668-A | Method for forming a fine pattern in a semiconductor device | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2000-12-05 | — | — | US | claimed |
| EP-0671483-B1 | Method for vapor deposition of a ceramic coating using a steam-containing carrier gas and non-alkoxy silane precursors | ENICHEM SPA (IT) | 1997-12-29 | — | — | EP | claimed |
| EP-0671483-A1 | Ceramic vapor deposited coating using a steam-containing carrier gas and non-alkoxy silane precursors | ENICHEM S.p.A. (IT) | 1995-09-13 | — | — | EP | claimed |
| US-5424095-A | Decomposing organosilicon precursor inside chemical reactor to form film of ceramic material on surface; prevents coking | ENIRICERCHE S.P.A. (IT) | 1995-06-13 | — | — | US | claimed |
| CN-111886676-B | Method for treating surface of wafer and composition therefor | 中央硝子株式会社 | 2024-09-27 | — | — | CN | disclosed |
| CN-117121173-A | Integration of fully aligned vias by selective deposition and resistivity reduction | 朗姆研究公司 | 2023-11-24 | — | — | CN | disclosed |
| CN-117121172-A | Method for manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and program | 株式会社国际电气 | 2023-11-24 | — | — | CN | disclosed |
| US-11603485-B2 | Surface treatment method of wafer and composition used for said method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-03-14 | — | — | US | disclosed |
| CN-105801612-B | Organoaminodisilane precursors and methods of thin film deposition comprising the same | 弗萨姆材料美国有限责任公司 | 2020-11-27 | — | — | CN | disclosed |
| EP-0098912-B1 | PROCESS FOR THE PREPARATION OF ALKOXYHYDRIDOSILANES | UNION CARBIDE CORPORATION (US) | 1986-04-23 | — | — | EP | disclosed |
| EP-0098911-A1 | Improved process for the preparation of oximatohydridosilanes and aminoxyhydridosilanes | UNION CARBIDE CORPORATION (US) | 1984-01-25 | — | — | EP | disclosed |
| EP-0098912-A1 | Process for the preparation of alkoxyhydridosilanes | UNION CARBIDE CORPORATION (US) | 1984-01-25 | — | — | EP | disclosed |
| US-4395564-A | REACTING AN ALCOHOL WITH SILYL-AMINE | UNION CARBIDE CORPORATION (US) | 1983-07-26 | — | — | US | disclosed |
| US-4384131-A | Process for the preparation of oximatohydridosilanes and aminoxyhydridosilanes | UNION CARBIDE CORPORATION (US) | 1983-05-17 | — | — | US | disclosed |