SCHEMBL2272960

SCHEMBL2272960

CCN(CC)[Si](C(C)C)(C(C)C)C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20500223 0.83
SCHEMBL2273744 0.83
SCHEMBL15361179 0.77
SCHEMBL15360590 0.75
SCHEMBL15360818 0.75 CYP1A2 (0.31)
SCHEMBL2273522 0.75
SCHEMBL20500242 0.75
SCHEMBL15360947 0.74
SCHEMBL15360619 0.74
SCHEMBL23778596 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11670512-B2 Selective deposition on silicon containing surfaces VERSUM MATERIALS US, LLC (US) 2023-06-06 US claimed
CN-110612364-B Selective deposition on silicon-containing surfaces 弗萨姆材料美国有限责任公司 2022-04-05 CN claimed
US-20210118684-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC 2021-04-22 US claimed
CN-110612364-A Selective deposition on silicon-containing surfaces 弗萨姆材料美国有限责任公司 2019-12-24 CN claimed
WO-2018170382-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC (US) 2018-09-20 WO claimed
WO-2000050478-A1 NOVEL FORMULATIONS OF ALKYLLITHIUMS WITH IMPROVED THERMAL STABILITY, PROCESSES TO PRODUCE THESE FORMULATIONS AND PROCESSES FOR USING THE SAME TO IMPROVE STABILITY OF LIVING POLYMER CHAIN ENDS FMC CORPORATION (US) 2000-08-31 WO claimed
US-11670512-B2 Selective deposition on silicon containing surfaces VERSUM MATERIALS US, LLC (US) 2023-06-06 US disclosed
CN-110612364-B Selective deposition on silicon-containing surfaces 弗萨姆材料美国有限责任公司 2022-04-05 CN disclosed
US-20210118684-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC 2021-04-22 US disclosed
CN-110612364-A Selective deposition on silicon-containing surfaces 弗萨姆材料美国有限责任公司 2019-12-24 CN disclosed
WO-2018170382-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC (US) 2018-09-20 WO disclosed
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed
WO-2000050478-A1 NOVEL FORMULATIONS OF ALKYLLITHIUMS WITH IMPROVED THERMAL STABILITY, PROCESSES TO PRODUCE THESE FORMULATIONS AND PROCESSES FOR USING THE SAME TO IMPROVE STABILITY OF LIVING POLYMER CHAIN ENDS FMC CORPORATION (US) 2000-08-31 WO disclosed