SCHEMBL22734136

SCHEMBL22734136

CN(C)C[SiH2]N([SiH2]CN(C)C)[SiH2]CN(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22655240 0.83
SCHEMBL2104280 0.69
SCHEMBL22734188 0.67
SCHEMBL17686504 0.67
SCHEMBL10933900 0.67
SCHEMBL17887280 0.64
SCHEMBL2101338 0.61
SCHEMBL31691493 0.61
SCHEMBL20522574 0.59
SCHEMBL9621470 0.59

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200388837-A1 SILICON-BASED ENERGY STORAGE DEVICES WITH SILYL AMINE COMPOUNDS OR DERIVATIVES OF SILYL AMINE CONTAINING ELECTROLYTE ADDITIVES ENEVATE CORPORATION 2020-12-10 US claimed
US-20260103477-A1 TRISILYLAMINE COMPOUND, COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM INCLUDING THE SAME, AND METHOD OF MANUFACTURING SILICON-CONTAINING THIN FILM USING THE SAME DNF CO LTD (KR) 2026-04-16 US disclosed
US-12304924-B2 Silylcyclodisilazane compound and method for manufacturing silicon-containing thin film using the same DNF CO., LTD. (KR) 2025-05-20 US disclosed
CN-114269761-B Novel silyl cyclodisilazane compound and method for producing silicon-containing film using same DNF有限公司 2024-12-10 CN disclosed
US-11817578-B2 Silicon-based energy storage devices with silyl amine compounds or derivatives of silyl amine containing electrolyte additives ENEVATE CORPORATION (US) 2023-11-14 US disclosed
US-20220275010-A1 NOVEL SILYLCYCLODISILAZANE COMPOUND AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE SAME DNF CO., LTD. (KR) 2022-09-01 US disclosed
CN-114269761-A Novel silylcyclodisilazane compound and method for manufacturing silicon-containing film using the same DNF有限公司 2022-04-01 CN disclosed
WO-2021034014-A1 NOVEL SILYLCYCLODISILAZANE COMPOUND AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE SAME DNF CO., LTD. (KR) 2021-02-25 WO disclosed
US-20200388837-A1 SILICON-BASED ENERGY STORAGE DEVICES WITH SILYL AMINE COMPOUNDS OR DERIVATIVES OF SILYL AMINE CONTAINING ELECTROLYTE ADDITIVES ENEVATE CORPORATION 2020-12-10 US disclosed