⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30988434 | 0.65 | — | — | |
| SCHEMBL765232 | 0.61 | — | — | |
| SCHEMBL22072579 | 0.59 | — | — | |
| SCHEMBL5176960 | 0.56 | — | — | |
| SCHEMBL10028832 | 0.56 | — | — | |
| SCHEMBL23877972 | 0.53 | — | — | |
| SCHEMBL21222729 | 0.53 | — | — | |
| SCHEMBL94354 | 0.53 | — | — | |
| SCHEMBL10779962 | 0.53 | — | — | |
| SCHEMBL63866 | 0.52 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8003587-B2 | Semiconductor process residue removal composition and process | EKC TECHNOLOGY, INC. (US) | 2011-08-23 | — | — | US | claimed |
| US-20090203566-A1 | Semi Conductor Process Residue Removal Composition and Process | EKC TECHNOLOGY, INC. | 2009-08-13 | — | — | US | claimed |
| US-6492311-B2 | REMOVING PHOTORESIST RESIDUE; DOES NOT CORRODE OR ATTACK TITANIUM OR OTHER METALLURGY, OXIDE OR NITRIDE LAYERS ON THE SUBSTRATE | EKC TECHNOLOGY, INC. | 2002-12-10 | — | — | US | claimed |
| US-6367486-B1 | REMOVES PHOTORESIST AND OTHER RESIDUE FROM INTEGRATED CIRCUIT SUBSTRATES. | EKC TECHNOLOGY, INC. | 2002-04-09 | — | — | US | claimed |
| US-8003587-B2 | Semiconductor process residue removal composition and process | EKC TECHNOLOGY, INC. (US) | 2011-08-23 | — | — | US | disclosed |
| US-20090203566-A1 | Semi Conductor Process Residue Removal Composition and Process | EKC TECHNOLOGY, INC. | 2009-08-13 | — | — | US | disclosed |
| US-7528098-B2 | Semiconductor process residue removal composition and process | EKC TECHNOLOGY, INC. (US) | 2009-05-05 | — | — | US | disclosed |
| US-20090099051-A1 | Aqueous fluoride compositions for cleaning semiconductor devices | EKC TECHNOLOGY, INC. | 2009-04-16 | — | — | US | disclosed |
| EP-1576072-B1 | AQUEOUS PHOSPHORIC ACID COMPOSITIONS FOR CLEANING SEMICONDUCTOR DEVICES | EKC TECHNOLOGY INC (US) | 2008-08-20 | — | — | EP | disclosed |
| US-7399365-B2 | Aqueous fluoride compositions for cleaning semiconductor devices | EKC TECHNOLOGY, INC. (US) | 2008-07-15 | — | — | US | disclosed |
| US-7235188-B2 | Aqueous phosphoric acid compositions for cleaning semiconductor devices | EKC TECHNOLOGY, INC. (US) | 2007-06-26 | — | — | US | disclosed |
| EP-1576072-A4 | AQUEOUS PHOSPHORIC ACID COMPOSITIONS FOR CLEANING SEMICONDUCTOR DEVICES | EKC TECHNOLOGY INC (US) | 2006-05-17 | — | — | EP | disclosed |
| WO-2003104185-A1 | SEMICONDUCTOR PROCESS RESIDUE REMOVAL COMPOSITION AND PROCESS | EKC TECHNOLOGY, INC. (US) | 2003-12-18 | — | — | WO | disclosed |
| US-20030228990-A1 | Semiconductor process residue removal composition and process | EKC TECHNOLOGY, INC. | 2003-12-11 | — | — | US | disclosed |
| US-6492311-B2 | REMOVING PHOTORESIST RESIDUE; DOES NOT CORRODE OR ATTACK TITANIUM OR OTHER METALLURGY, OXIDE OR NITRIDE LAYERS ON THE SUBSTRATE | EKC TECHNOLOGY, INC. | 2002-12-10 | — | — | US | disclosed |
| US-6367486-B1 | REMOVES PHOTORESIST AND OTHER RESIDUE FROM INTEGRATED CIRCUIT SUBSTRATES. | EKC TECHNOLOGY, INC. | 2002-04-09 | — | — | US | disclosed |
| US-20010006936-A1 | ETHYENEDIAMINETETRAACETIC ACID OR ITS AMMONIUM SALT SEMICONDUCTOR PROCESS RESIDUE REMOVAL COMPOSITION AND PROCESS | EKC TECHNOLOGY, INC. | 2001-07-05 | — | — | US | disclosed |
| EP-0975731-A4 | ETHYLENEDIAMINETETRAACETIC ACID OR ITS AMMONIUM SALT SEMICONDUCTOR PROCESS RESIDUE REMOVAL COMPOSITION AND PROCESS | EKC TECHNOLOGY INC (US) | 2001-02-07 | — | — | EP | disclosed |
| EP-0975731-A1 | ETHYLENEDIAMINETETRAACETIC ACID OR ITS AMMONIUM SALT SEMICONDUCTOR PROCESS RESIDUE REMOVAL COMPOSITION AND PROCESS | EKC TECHNOLOGY, INC. (US) | 2000-02-02 | — | — | EP | disclosed |
| WO-1998045399-A1 | ETHYLENEDIAMINETETRAACETIC ACID OR ITS AMMONIUM SALT SEMICONDUCTOR PROCESS RESIDUE REMOVAL COMPOSITION AND PROCESS | EKC TECHNOLOGY, INC. (US) | 1998-10-15 | — | — | WO | disclosed |